Metrology of small structures for the manufacturing of electronic and optical devices

Short name: Scatterometry

Scatterometry is an optical method to determine geometrical and optical parameters of structures on a surface. The structured surface is illuminated by a light wave, the light diffracted or scattered at the surface is measured and the results, the measured distribution of the scattered light, is evaluated to provide the searched geometrical and optical parameters.

This EMRP project addresses to overcome current limitations in optical scatterometry and to meet current and future metrology requirements in semiconductor and in optics industry especially with respect to traceability and measurement uncertainties. It will significantly improve and extend scatterometry in the named contexts both methodically and with respect to the application area.

JRP start date and duration: October 2011, 36 months