Workshop on advanced optical measurements

In cooperation with the Berlin-Brandenburg Photonics Cluster we organize a workshop on advanced optical measurements, which will take place in Berlin-Adlershof, Germany, January 27th, 2016.

The first announcement flyer is published here.

Registration is closed.

Topics

  • Traceable characterization of thin film energy materials by combination of optical and X-ray methods
  • Optical characterization of thin films used in energy conversion technology and energy efficient lighting
  • New trends in optical thin film measurement and design
  • Optical measurements in nanotechnology

session 1

  • Nanometrology by optical means: an overview on coherent Fourier scatterometry and its future developments
    Omar El Gawhary, VSL, The Netherlands
  • Characterization of two dimensional gratings by spectroscopic ellipsometry
    Sven Peters, Adrian Blümich, SENTECH Instruments GmbH, Germany
  • New Trends in Spectroscopic Imaging Ellipsometry
    Sebastian Funke, Accurion GmbH, Germany
  • How to  make accurate scatterometry and ellipsometry measurement
    Poul-Erik Hansen, DFM, Denmark

session 2

  • Combining time-resolved X-ray analysis and optical spectroscopy: Insights into the evolution of structure-property relations during film growth
    Roland Mainz, HZB, Germany
  • Advanced characterization of thinlayered energy materials by X-ray spectrometry
    Cornelia Streeck, PTB, Germany
  • Interface characterization of ultra-thin multilayer systems by combined  analysis of diffuse scattering, reflectivity and fluorescence measurements
    Anton Haase, PTB, Germany

session 3

  • Optical measurements of surface recombination in ALD coated nanostructures for photovoltaic applications
    Hele Savin, Aalto University, Finland
  • Measurement of Physical Properties on Thin Film Materials
    Heinz Renner, Linseis Messgeräte GmbH, Germany
  • Functional mapping/imaging of multilayer organic solar cells
    Fernando Castro, NPL, UK
  • Synchrotron-radiation-based ellipsometry in the visible to vacuum ultraviolet spectral range
    Maciej Neumann, ISAS, Germany

poster session / networking reception

all attendees are invited to present their own contributions regarding the topics of the workshop during the poster session

registered poster contributions (to be completed):

  • Characterization of Nano-textured samples using Mueller Polarimetry
  • Characterisation of Non-ideal Samples with Spectroscopic Mapping and Imaging Ellipsometry
  • GIXRF-NEXAFS for compositional thin film analysis and chemical speziation
  • Investigation of thinfilm samples with a magneto-optical scanning technique
  • Ellipsometric characterization of doped SnOx layers for novel SPR based gas sensors
  • Calibration Thin Films of Cu(In,Ga)Se2 characterized by Reference-free X-Ray Fluorescence Analysis

Workshop App my.yapp.us/4AFWVF

Contact

Andreas HertwigMichael Kolbe

E-mail: thin-films@bam.de

Phone: +49 30 8104 3515

E-mail: michael.kolbe@ptb.de

Phone: +49 30 3481 7131

We would like to to thank the Berlin-Brandenburg Photonics Cluster as well as the European X-ray Spectrometry Association for their support.

Competence Network for Optical Technologies

Berlin Partner for Business and Technology

European Regional Development Fund

European X-ray Spectrometry Association