• Traceable characterization of thin film energy materials by combination of optical and X-ray methods
• Optical characterization of thin films used in energy conversion technology and energy efficient lighting
• New trends in optical thin film measurement and design
• Optical measurements in nanotechnology

session 1

• Nanometrology by optical means: an overview on coherent Fourier scatterometry and its future developments
  Omar El Gawhary, VSL, The Netherlands
• Characterization of two dimensional gratings by spectroscopic ellipsometry
  Sven Peters, Adrian Blümich, SENTECH Instruments GmbH, Germany
• New Trends in Spectroscopic Imaging Ellipsometry
  Sebastian Funke, Accurion GmbH, Germany
• How to  make accurate scatterometry and ellipsometry measurement
  Poul-Erik Hansen, DFM, Denmark

session 2

• Combining time-resolved X-ray analysis and optical spectroscopy: Insights into the evolution of structure-property relations during film growth
  Roland Mainz, HZB, Germany
• Advanced characterization of thinlayered energy materials by X-ray spectrometry
  Cornelia Streeck, PTB, Germany
• Interface characterization of ultra-thin multilayer systems by combined  analysis of diffuse scattering, reflectivity and fluorescence measurements
  Anton Haase, PTB, Germany

session 3

• Optical measurements of surface recombination in ALD coated nanostructures for photovoltaic applications
  Hele Savin, Aalto University, Finland
• Measurement of Physical Properties on Thin Film Materials
  Heinz Renner, Linseis Messgeräte GmbH, Germany
• Functional mapping/imaging of multilayer organic solar cells
  Fernando Castro, NPL, UK
• Synchrotron-radiation-based ellipsometry in the visible to vacuum ultraviolet spectral range
  Maciej Neumann, ISAS, Germany

poster session / networking reception

all attendees are invited to present their own contributions regarding the topics of the workshop during the poster session

registered poster contributions (to be completed):

• Characterization of Nano-textured samples using Mueller Polarimetry
• Characterisation of Non-ideal Samples with Spectroscopic Mapping and Imaging Ellipsometry
• GIXRF-NEXAFS for compositional thin film analysis and chemical speziation
• Investigation of thinfilm samples with a magneto-optical scanning technique
• Ellipsometric characterization of doped SnO_x layers for novel SPR based gas sensors
• Calibration Thin Films of Cu(In,Ga)Se₂ characterized by Reference-free X-Ray Fluorescence Analysis

Venue