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Sub-wavelength features in spectroscopic Mueller matrix ellipsometry.

19.09.2019

Spectroscopic Mueller matrix ellipsometry is a promising tool for the characterization of nanostruc-tured surfaces. Direct optical measurements of samples with geometrical dimensions smaller than the incident wavelength are inherently limited by the classical resolution limit. However, as an indi-rect measurement technique, this limit does not apply to ellipsometry. In this contribution, we in-vestigated the influence of manipulations of the near-field on the off-diagonal Mueller matrix ele-ments. We designed and fabricated individual resist nanostructures on a silicon wafer. The struc-tures possess distinct geometrical features in the range from several nanometers to a few microm-eters and were produced by electron beam lithography. We performed spectroscopic measure-ments with a commercial ellipsometer to determine the Mueller matrices of the samples. In addi-tion, nanosized silicon carbide grating structures were examined. Using a Finite Element software, we compared the measurements to simulations of the Mueller matrices to identify geometrical features.

Käseberg, Tim; 4.2, Bild- und Wellenoptik, PTB-Braunschweig ; 4.01, Metrologie für funktionale Nanosysteme, PTB-Braunschweig
Siefke, Thomas; Friedrich-Schiller-Universität Jena, Abbe Center of Photonics, Institute of Applied Physics, Jena, GERMANY
Wurm, Matthias; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Kroker, Stefanie; 4.01, Metrologie für funktionale Nanosysteme, PTB-Braunschweig ; Technische Universität Braunschweig, Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig