DUV-Mikroskopie

Referenzen

	Z. Li, F. p, D. Bergmann, B. Bodermann A modelling-oriented 193 nm DUV microscope for advanced lithography 5th EOS Topical Meeting on Advanced Imaging Techniques, Engelberg, Switzerland, 29 June - 02, July, 2010 5th EOS Topical Meeting on Advanced Imaging Techniques (2010) CD-ROM
	A quantitative 193 nm DUV microscope Euspen, Delft, The Netherlands, 31, May - 04, June, 2010 Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology Band 1 (2010) , Seite 43-46
	B. Bodermann, Z. Li, F. Pilarski, D. Bergmann A 193 nm microscope for CD metrology for the 32nm node and beyond 26th European Mask and Lithography Conference, Grenoble, France, 18-20, January, 2010 26th European Mask and Lithography Conference; Proceedings of SPIE Band 7545 (2010) DOI: 10.1117/12.863627 CD-ROM file name: 7545_15.pdf, 75450A-1 - 75450A-9
	Z. Li, F. Pilarski, D. Bergmann, B. Bodermann, E. Buhr Aufbau eines 193 nm Mikroskops als Strukturbreitenmesssystem für Photomasken DGaO-Jahrestagung, Wetzlar, Germany, 25-29, Mai, 2010 DGaO-Proceedings Band 111 (2010) Online only
	G. Ehret, F. Pilarski, D. Bergmann, B. Bodermann, E. Buhr A new high-aperture 193 nm microscope for the traceable dimensional characterization of micro- and nanostructures Measurement Science and Technology 20(8), 084010-1 - 084010-10 ( 2009) DOI: 10.1088/0957-0233/20/8/084010
	Z. Li, F. Pilarski, D. Bergmann, B. Bodermann A 193 nm optical CD metrology tool for the 32 nm node Photomask Technology 2009; Proceedings of SPIE on CD-ROM Band 7488 (2009) DOI: 10.1117/12.829629 CD-ROM file name: 7488-53.pdf, 74881J-1 - 74881J-9
	Z. Li, F. Pilarski, D. Bergmann, B. Bodermann A metrological 193 nm DUV microscope for CD metrology 4th EOS Topical Meeting on Advanced Imaging Technique, Jena, Germany, 10-12, June 2009 4th EOS Topical Meeting on Advanced Imaging Techniques (2009) , Seite 42-43
	G. Ehret, F. Pilarski, D. Bergmann, B. Bodermann, E. Buhr, W. Mirandé Konstruktive Realisierung eines hochaperturigen 193nm-Mikroskops für die quantitative dimensionelle Charakterisierung von Mikro- und Nanostrukturen 109. Jahrestagung der Deutschen Gesellschaft für angewandte Optik (DGaO), Esslingen, Germany, 13-17, May, 2008 DGaO-Proceedings Band 109 (2008) , Seite 34 PosterOnline only
	B. Bodermann, G. Ehret, W. Mirandé UV an DUV microscopy for dimensional metrology on micro- and nanostructures SPIE Conference Optical Metrology in Production Engineering, Strasbourg, France, 26-30, April, 2004 Optical metrology in production engineering; Proceedings of SPIE Band 5457 (2004) , Seite 35-43