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% Creation date: 2024-04-18
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@Article { WinklerNFHLDB2023,
   title = {Global Sensitivity Analysis and Uncertainty Quantification for Simulated Atrial Electrocardiograms},
   journal = {Metrology},
   year = {2023},
   month = {12},
   day = {26},
   volume = {3},
   number = {1},
   pages = {1-28},
   tags = {8.4,8.41,8.43, UQ},
   DOI = {https://doi.org/10.3390/metrology3010001},
   author = {Winkler, Benjamin and Nagel, Claudia and Farchmin, Nando and Heidenreich, Sebastian and Loewe, Axel and D{\"o}ssel, Olaf and B{\"a}r, Markus}
}

@Article { AndrleFHHSS2021,
   title = {Invertible Neural Networks Versus MCMC for Posterior Reconstruction in Grazing Incidence X-Ray Fluorescence},
   journal = {Scale Space and Variational Methods in Computer Vision},
   year = {2021},
   month = {4},
   day = {30},
   pages = {528--539},
   tags = {8.4, 8.43, UQ},
   DOI = {10.1007/978-3-030-75549-2_42},
   author = {Andrle, A and Farchmin, N and Hagemann, P and Heidenreich, S and Soltwisch, V and Steidl, G}
}

@Article { EigelFHT2021,
   title = {Efficient approximation of high-dimensional exponentials by 
tensornetworks},
   journal = {International Journal of Uncertainty Quantification},
   year = {2021},
   pages = {25-51},
   tags = {8.4,8.43,UQ},
   DOI = {10.1615/Int.J.UncertaintyQuantification.2022039164},
   author = {Eigel, M. and Farchmin, N. and Heidenreich, S. and Trunschke, P.}
}

@Article { FarchminHSWBBH2020,
   title = {Efficient Bayesian inversion for shape reconstruction of lithography masks},
   journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
   year = {2020},
   month = {5},
   day = {5},
   volume = {2},
   number = {19},
   pages = {1--11},
   tags = {8.4,8.43,UQ,Scatter-Inv},
   DOI = {10.1117/1.JMM.19.2.024001},
   author = {Farchmin, N and Hammerschmidt, M and Schneider, P I and Wurm, M and Bodermann, B and B{\"a}r, M and Heidenreich, S}
}

@Conference { CasforZapataFPNSHLKS2020,
   title = {Sensitivity analysis for the detection of pitchwalk in self-
aligned quadruple patterning by GISAXS},
   year = {2020},
   month = {3},
   day = {20},
   volume = {11325},
   tags = {8.4,8.43,UQ},
   publisher = {SPIE},
   booktitle = {Proc. of SPIE},
   event_place = {San Jose, USA},
   event_name = {Metrology, Inspection, and Process Control for Microlithography XXXIV},
   event_date = {20.03.2020},
   DOI = {10.1117/12.2552037},
   author = {Casfor Zapata, M. and Farchmin, N. and Pfl{\"u}ger, M. and Nikolaev, K. and Soltwisch, V. and Heidenreich, S. and Laube, C. and Kolbe, M. and Scholze, F.}
}