Publication single view
Article
Title: | Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM |
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Author(s): | G. Dai, K. Hahm, F. Scholze, M.-A. Henn, H. Groß, J. Fluegge and H. Bosse |
Journal: | Meas. Sci. Tech. |
Year: | 2014 |
Volume: | 25 |
Issue: | 4 |
Pages: | 044002 |
IOP Publishing | |
DOI: | 10.1088/0957-0233/25/4/044002 |
ISSN: | 0957-0233 |
Web URL: | http://iopscience.iop.org/article/10.1088/0957-0233/25/4/044002 |
Keywords: | Scatterometrie |
Tags: | 8.41,Scatter-EUV |