Publication single view
Article
Title: | Optical flatness metrology: 40 years of progress |
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Author(s): | M. Schulz, A. Wiegmann, A. Marquez and C. Elster |
Journal: | Opt. Pura Apl |
Year: | 2008 |
Book title: | Opt. Pura Apl |
Volume: | 41 |
Pages: | 325 |
DOI: | 10.2971/jeos.2010.10011 |
File URL: | http://www.sedoptica.es/Menu_Volumenes/pdfs/314.pdf |
Keywords: | Deflectometry, Interferometry, Mathematical methods, Metrology, Optical inspection |
Tags: | 8.42, SimOpt, Form |
Abstract: | Optical flatness metrology has improved significantly in the last decades due to novel measurement tools and new math-based methods. An overview is given summarizing the most important optical techniques for flatness metrology at the nanometer level. The capabilities of modern methods such as the interferometric three-flat test accompanied by a computer-aided evaluation, the Traceable Multi Sensor method as an improved stitching method, and difference deflectometry represented by the Extended Shear Angle Difference method are reviewed. |
Note: | Open Access |