| Title: |
Optical flatness metrology: 40 years of progress |
| Author(s): |
M. Schulz, A. Wiegmann, A. Marquez and C. Elster |
| Journal: |
Opt. Pura Apl |
| Year: |
2008 |
| Book title: |
Opt. Pura Apl |
| Volume: |
41 |
| Pages: |
325 |
| DOI: |
10.2971/jeos.2010.10011 |
| File URL: |
http://www.sedoptica.es/Menu_Volumenes/pdfs/314.pdf |
| Keywords: |
Deflectometry, Interferometry, Mathematical methods, Metrology, Optical inspection |
| Tags: |
8.42, SimOpt, Form |
| Abstract: |
Optical flatness metrology has improved significantly in the last decades due to novel measurement tools and new math-based methods. An overview is given summarizing the most important optical techniques for flatness metrology at the nanometer level. The capabilities of modern methods such as the interferometric three-flat test accompanied by a computer-aided evaluation, the Traceable Multi Sensor method as an improved stitching method, and difference deflectometry represented by the Extended Shear Angle Difference method are reviewed. |
| Note: |
Open Access |
