Publication single view
Conference
| Title: | Sensitivity analysis for the detection of pitchwalk in self- aligned quadruple patterning by GISAXS |
|---|---|
| Author(s): | M. Casfor Zapata, N. Farchmin, M. Pflüger, K. Nikolaev, V. Soltwisch, S. Heidenreich, C. Laube, M. Kolbe and F. Scholze |
| Year: | 2020 |
| Book title: | Proc. of SPIE |
| Volume: | 11325 |
| SPIE | |
| Conference name: | Metrology, Inspection, and Process Control for Microlithography XXXIV |
| San Jose, USA | |
| Conference date: | 20.03.2020 |
| DOI: | 10.1117/12.2552037 |
| Tags: | 8.4,8.43,UQ |