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Mathematical Modelling and Data Analysis

Department 8.4

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Title: Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM
Author(s): G. Dai, K. Hahm, F. Scholze, M.-A. Henn, H. Groß, J. Fluegge and H. Bosse
Journal: Meas. Sci. Tech.
Year: 2014
Volume: 25
Issue: 4
Pages: 044002
IOP Publishing
DOI: 10.1088/0957-0233/25/4/044002
ISSN: 0957-0233
Web URL: http://iopscience.iop.org/article/10.1088/0957-0233/25/4/044002
Keywords: Scatterometrie
Tags: 8.41,Scatter-EUV

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