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Mathematical Modelling and Data Analysis

Department 8.4

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Title: Efficient Bayesian inversion for shape reconstruction of lithography masks
Author(s): N. Farchmin, M. Hammerschmidt, P. I. Schneider, M. Wurm, B. Bodermann, M. Bär and S. Heidenreich
Journal: Journal of Micro/Nanolithography, MEMS, and MOEMS
Year: 2020
Volume: 2
Issue: 19
Pages: 1--11
DOI: 10.1117/1.JMM.19.2.024001
Tags: 8.4,8.43,UQ,Scatter-Inv

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