Publication single view
Article
| Title: | Optical flatness metrology: 40 years of progress |
|---|---|
| Author(s): | M. Schulz, A. Wiegmann, A. Marquez and C. Elster |
| Journal: | Opt. Pura Apl |
| Year: | 2008 |
| Book title: | Opt. Pura Apl |
| Volume: | 41 |
| Pages: | 325 |
| DOI: | 10.2971/jeos.2010.10011 |
| File URL: | http://www.sedoptica.es/Menu_Volumenes/pdfs/314.pdf |
| Keywords: | Deflectometry, Interferometry, Mathematical methods, Metrology, Optical inspection |
| Tags: | 8.42, SimOpt, Form |
| Abstract: | Optical flatness metrology has improved significantly in the last decades due to novel measurement tools and new math-based methods. An overview is given summarizing the most important optical techniques for flatness metrology at the nanometer level. The capabilities of modern methods such as the interferometric three-flat test accompanied by a computer-aided evaluation, the Traceable Multi Sensor method as an improved stitching method, and difference deflectometry represented by the Extended Shear Angle Difference method are reviewed. |
| Note: | Open Access |