Publications 8.41
Publication single view
Article
| Title: | Efficient Bayesian inversion for shape reconstruction of lithography masks |
|---|---|
| Author(s): | N. Farchmin, M. Hammerschmidt, P. I. Schneider, M. Wurm, B. Bodermann, M. Bär and S. Heidenreich |
| Journal: | Journal of Micro/Nanolithography, MEMS, and MOEMS |
| Year: | 2020 |
| Volume: | 2 |
| Issue: | 19 |
| Pages: | 1--11 |
| DOI: | 10.1117/1.JMM.19.2.024001 |
| Tags: | 8.4,8.43,UQ,Scatter-Inv |