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News from department 7.1

The announcement made by the large semiconductor manufacturers Samsung and TSMC in autumn 2018 that they are going to use EUV lithography for the manufacturing of high-end processors marks the commercial breakthrough of this technology after a long development phase. PTB has contributed to this development in metrological matters through its work at the synchrotron radiation sources BESSY II and...

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The significant challenges posed by the increasing complexity of nanostructured surfaces used in technological applications include the characterization of such surfaces. The importance of complex and multidimensional nanostructures consisting of several materials is particularly noticeable in the semiconductor industry. At PTB's laboratory at the BESSY II electron storage ring, synchrotron...

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PTB and ASML are putting a new test beamline into operation at BESSY

 

Increasing miniaturization in the microelectronic sector has created inevitable facts: In the future, structures on microchips and on other components will have to be manufactured by means of lithography in the EUV range, which means using extremely short wavelengths of just 13.5 nm. For test measurements, the...

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Fundamental material parameters such as the interaction cross sections used to describe the interaction of matter with radiation are very important, both for fundamental research and for diagnostic and analytical applications. In collaboration with Fraunhofer IPM in Freiburg im Breisgau, interaction cross sections for the photoionization of noble gases in the VUV spectral range have recently been...

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Raul Garcia Diez from the Helmholtz-Zentrum Berlin – and former doctoral candidate of the Physikalisch-Technische Bundesanstalt (PTB) – was awarded the prize for the "Best doctoral thesis Adlershof 2017" on 14 February 2018 for the thesis he elaborated in the X-ray Radiometry working group at PTB's laboratory at BESSY II. This prize is endowed with 3000 euros and has been awarded every year...

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