Publikations Einzelansicht
Artikel
Titel: | Optical flatness metrology: 40 years of progress |
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Autor(en): | M. Schulz, A. Wiegmann, A. Marquez and C. Elster |
Journal: | Opt. Pura Apl |
Jahr: | 2008 |
Buchtitel: | Opt. Pura Apl |
Band: | 41 |
Seite(n): | 325 |
DOI: | 10.2971/jeos.2010.10011 |
Datei / URL: | http://www.sedoptica.es/Menu_Volumenes/pdfs/314.pdf |
Schlüsselwörter: | Deflectometry, Interferometry, Mathematical methods, Metrology, Optical inspection |
Marker: | 8.42, SimOpt, Form |
Zusammenfassung: | Optical flatness metrology has improved significantly in the last decades due to novel measurement tools and new math-based methods. An overview is given summarizing the most important optical techniques for flatness metrology at the nanometer level. The capabilities of modern methods such as the interferometric three-flat test accompanied by a computer-aided evaluation, the Traceable Multi Sensor method as an improved stitching method, and difference deflectometry represented by the Extended Shear Angle Difference method are reviewed. |
Bemerkung: | Open Access |