Publikations Einzelansicht
Konferenz
Titel: | Sensitivity analysis for the detection of pitchwalk in self- aligned quadruple patterning by GISAXS |
---|---|
Autor(en): | M. Casfor Zapata, N. Farchmin, M. Pflüger, K. Nikolaev, V. Soltwisch, S. Heidenreich, C. Laube, M. Kolbe and F. Scholze |
Jahr: | 2020 |
Buchtitel: | Proc. of SPIE |
Band: | 11325 |
SPIE | |
Konferenz Name: | Metrology, Inspection, and Process Control for Microlithography XXXIV |
San Jose, USA | |
Konferenz Datum: | 20.03.2020 |
DOI: | 10.1117/12.2552037 |
Marker: | 8.4,8.43,UQ |