This file was created by the TYPO3 extension bib --- Timezone: CET Creation date: 2023-01-31 Creation time: 04-44-40 --- Number of references 9 article FarchminHSWBBH2020 Journal of Micro/Nanolithography, MEMS, and MOEMS 2020 5 5 2 19 1--11 8.4,8.41,8.43,UQ,Scatter-Inv 10.1117/1.JMM.19.2.024001 NFarchmin MHammerschmidt P ISchneider MWurm BBodermann MBär SHeidenreich article GrossHB2016 Measurement 2017 2 1 98 339--346 8.4,8.41,Scatter-Inv 10.1016/j.measurement.2016.08.027 HGross SHeidenreich MBär article heidenreich2015bayesian International Journal for Uncertainty Quantification 2015 1 8 511 8.41, Scatter-Inv, UQ 10.1615/Int.J.UncertaintyQuantification.2015013050 SHeidenreich HGross MBär article Gross2015 Cont. Dyn. S. - S 2015 1 3 8 497-519 8.41,Scatter-Inv 10.3934/dcdss.2015.8.497 HGroß SHeidenreich M-AHenn MBär ARathsfeld article Heidenreich2014a J. Phys. Conf. Ser. 2014 490 1 012007 8.41,Bayes,Scatter-Inv,Regression,8.42, UQ http://iopscience.iop.org/article/10.1088/1742-6596/490/1/012007 IOP Publishing en 1742-6596 10.1088/1742-6596/490/1/012007 SHeidenreich HGross M-AHenn CElster MBär article Henn2014 Measurement Science and Technology 2014 25 4 044003 8.41,Scatter-Inv,Scatterometrie, 8.42 http://iopscience.iop.org/article/10.1088/0957-0233/25/4/044003 IOP Publishing en 0957-0233 10.1088/0957-0233/25/4/044003 M-AHenn HGross SHeidenreich FScholze CElster MBär article Gross2014 J. Europ.Opt. Soci.Rap. Pub. 2014 9 14003 In the present paper, we propose a 2D-Fourier transform method as a simple and efficient algorithm for stochastical and numerical studies to investigate the systematic impacts of line edge roughness on light diffraction pattern of periodic line-space structures. The key concept is the generation of ensembles of rough apertures composed of many slits, to calculate the irradiance of the illuminated rough apertures far away from the aperture plane, and a comparison of their light intensities to those of the undisturbed, ’non-rough’ aperture. We apply the Fraunhofer approximation and interpret the rough apertures as binary 2D-gratings to compute their diffraction patterns very efficiently as the 2D-Fourier transform of the light distribution of the source plane. The rough edges of the aperture slits are generated by means of power spectrum density (PSD) functions, which are often used in metrology of rough geometries. The mean efficiencies of the rough apertures reveal a systematic exponential decrease for higher diffraction orders if compared to the diffraction pattern of the unperturbed aperture. This confirms former results, obtained by rigorous calculations with computational expensive finite element methods (FEM) for a simplified roughness model. The implicated model extension for scatterometry by an exponential damping factor for the calculated efficiencies allows to determine the standard deviation &sigma;<prt>\_</prt> r of line edge roughness along with the critical dimensions (CDs), i.e., line widths, heights and other profile properties in the sub-micrometer range. First comparisons with the corresponding roughness value determined by 3D atomic force microscopy (3D AFM) reveal encouraging results. Scatterometrie,Scatterometry,atomic force microscopy,line edge roughness,power spectrum density 8.41,Scatter-Inv http://www.jeos.org/index.php/jeos<prt>\_</prt>rp/article/view/14003 en 1990-2573 10.2971/jeos.2014.14003 HGroß SHeidenreich M-AHenn GDai FScholze MBär article Henn2012a Opt. Lett. 2012 37 24 5229--5231 8.41,Scatter-Inv 8.41,Scatter-Inv 10.1364/OL.37.005229 M-AHenn SHeidenreich HGroß ARathsfeld FScholze MBär article GrosHHRB2012 Appl. Opt. 2012 51 30 7384--94 We investigate the impact of line-edge and line-width roughness (LER, LWR) on the measured diffraction intensities in angular resolved extreme ultraviolet (EUV) scatterometry for a periodic line-space structure designed for EUV lithography. LER and LWR with typical amplitudes of a few nanometers were previously neglected in the course of the profile reconstruction. The two-dimensional (2D) rigorous numerical simulations of the diffraction process for periodic structures are carried out with the finite element method providing a numerical solution of the 2D Helmholtz equation. To model roughness, multiple calculations are performed for domains with large periods, containing many pairs of line and space with stochastically chosen line and space widths. A systematic decrease of the mean efficiencies for higher diffraction orders along with increasing variances is observed and established for different degrees of roughness. In particular, we obtain simple analytical expressions for the bias in the mean efficiencies and the additional uncertainty contribution stemming from the presence of LER and/or LWR. As a consequence this bias can easily be included into the reconstruction model to provide accurate values for the evaluated profile parameters. We resolve the sensitivity of the reconstruction from this bias by using simulated data with LER/LWR perturbed efficiencies for multiple reconstructions. If the scattering efficiencies are bias-corrected, significant improvements are found in the reconstructed bottom and top widths toward the nominal values. 8.41,Diffraction gratings,Metrology,Scatter-Inv,Scatterometrie 8.41,Scatter-Inv http://www.osapublishing.org/viewmedia.cfm?uri=ao-51-30-7384<prt>&amp;</prt>seq=0<prt>&amp;</prt>html=true Optical Society of America EN 1539-4522 10.1364/AO.51.007384 HGroß M-AHenn SHeidenreich ARathsfeld MBär