This file was created by the TYPO3 extension
bib
--- Timezone: CET
Creation date: 2023-01-31
Creation time: 04-44-40
--- Number of references
9
article
FarchminHSWBBH2020
Efficient Bayesian inversion for shape reconstruction of lithography masks
Journal of Micro/Nanolithography, MEMS, and MOEMS
2020
5
5
2
19
1--11
8.4,8.41,8.43,UQ,Scatter-Inv
10.1117/1.JMM.19.2.024001
NFarchmin
MHammerschmidt
P ISchneider
MWurm
BBodermann
MBär
SHeidenreich
article
GrossHB2016
Impact of different stochastic line edge roughness patterns on measurements in scatterometry - a simulation study
Measurement
2017
2
1
98
339--346
8.4,8.41,Scatter-Inv
10.1016/j.measurement.2016.08.027
HGross
SHeidenreich
MBär
article
heidenreich2015bayesian
Bayesian approach to the statistical inverse problem of scatterometry: Comparison of three surrogate models
International Journal for Uncertainty Quantification
2015
1
8
511
8.41, Scatter-Inv, UQ
10.1615/Int.J.UncertaintyQuantification.2015013050
SHeidenreich
HGross
MBär
article
Gross2015
Modeling aspects to improve the solution of the inverse problem in scatterometry
Cont. Dyn. S. - S
2015
1
3
8
497-519
8.41,Scatter-Inv
10.3934/dcdss.2015.8.497
HGroß
SHeidenreich
M-AHenn
MBär
ARathsfeld
article
Heidenreich2014a
A surrogate model enables a Bayesian approach to the inverse problem of scatterometry
J. Phys. Conf. Ser.
2014
490
1
012007
8.41,Bayes,Scatter-Inv,Regression,8.42, UQ
http://iopscience.iop.org/article/10.1088/1742-6596/490/1/012007
IOP Publishing
en
1742-6596
10.1088/1742-6596/490/1/012007
SHeidenreich
HGross
M-AHenn
CElster
MBär
article
Henn2014
Improved reconstruction of critical dimensions in extreme ultraviolet scatterometry by modeling systematic errors
Measurement Science and Technology
2014
25
4
044003
8.41,Scatter-Inv,Scatterometrie, 8.42
http://iopscience.iop.org/article/10.1088/0957-0233/25/4/044003
IOP Publishing
en
0957-0233
10.1088/0957-0233/25/4/044003
M-AHenn
HGross
SHeidenreich
FScholze
CElster
MBär
article
Gross2014
Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry
J. Europ.Opt. Soci.Rap. Pub.
2014
9
14003
In the present paper, we propose a 2D-Fourier transform method as a simple and efficient algorithm for stochastical and numerical studies to investigate the systematic impacts of line edge roughness on light diffraction pattern of periodic line-space structures. The key concept is the generation of ensembles of rough apertures composed of many slits, to calculate the irradiance of the illuminated rough apertures far away from the aperture plane, and a comparison of their light intensities to those of the undisturbed, â€™non-roughâ€™ aperture. We apply the Fraunhofer approximation and interpret the rough apertures as binary 2D-gratings to compute their diffraction patterns very efficiently as the 2D-Fourier transform of the light distribution of the source plane. The rough edges of the aperture slits are generated by means of power spectrum density (PSD) functions, which are often used in metrology of rough geometries. The mean efficiencies of the rough apertures reveal a systematic exponential decrease for higher diffraction orders if compared to the diffraction pattern of the unperturbed aperture. This confirms former results, obtained by rigorous calculations with computational expensive finite element methods (FEM) for a simplified roughness model. The implicated model extension for scatterometry by an exponential damping factor for the calculated efficiencies allows to determine the standard deviation σ<prt>\_</prt> r of line edge roughness along with the critical dimensions (CDs), i.e., line widths, heights and other profile properties in the sub-micrometer range. First comparisons with the corresponding roughness value determined by 3D atomic force microscopy (3D AFM) reveal encouraging results.
Scatterometrie,Scatterometry,atomic force microscopy,line edge roughness,power spectrum density
8.41,Scatter-Inv
http://www.jeos.org/index.php/jeos<prt>\_</prt>rp/article/view/14003
en
1990-2573
10.2971/jeos.2014.14003
HGroß
SHeidenreich
M-AHenn
GDai
FScholze
MBär
article
Henn2012a
Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry
Opt. Lett.
2012
37
24
5229--5231
8.41,Scatter-Inv
8.41,Scatter-Inv
10.1364/OL.37.005229
M-AHenn
SHeidenreich
HGroß
ARathsfeld
FScholze
MBär
article
GrosHHRB2012
Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry
Appl. Opt.
2012
51
30
7384--94
We investigate the impact of line-edge and line-width roughness (LER, LWR) on the measured diffraction intensities in angular resolved extreme ultraviolet (EUV) scatterometry for a periodic line-space structure designed for EUV lithography. LER and LWR with typical amplitudes of a few nanometers were previously neglected in the course of the profile reconstruction. The two-dimensional (2D) rigorous numerical simulations of the diffraction process for periodic structures are carried out with the finite element method providing a numerical solution of the 2D Helmholtz equation. To model roughness, multiple calculations are performed for domains with large periods, containing many pairs of line and space with stochastically chosen line and space widths. A systematic decrease of the mean efficiencies for higher diffraction orders along with increasing variances is observed and established for different degrees of roughness. In particular, we obtain simple analytical expressions for the bias in the mean efficiencies and the additional uncertainty contribution stemming from the presence of LER and/or LWR. As a consequence this bias can easily be included into the reconstruction model to provide accurate values for the evaluated profile parameters. We resolve the sensitivity of the reconstruction from this bias by using simulated data with LER/LWR perturbed efficiencies for multiple reconstructions. If the scattering efficiencies are bias-corrected, significant improvements are found in the reconstructed bottom and top widths toward the nominal values.
8.41,Diffraction gratings,Metrology,Scatter-Inv,Scatterometrie
8.41,Scatter-Inv
http://www.osapublishing.org/viewmedia.cfm?uri=ao-51-30-7384<prt>&</prt>seq=0<prt>&</prt>html=true
Optical Society of America
EN
1539-4522
10.1364/AO.51.007384
HGroß
M-AHenn
SHeidenreich
ARathsfeld
MBär