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Workshop Optische Metrologie (Photonics Days Berlin Brandenburg)

The optics and semiconductor industry uses increasingly innovative materials and complex nanostructures, whose optical properties are difficult to measure and often not accurately known. Hence, traceable metrology and advanced mathematical methods to characterize these materials for wavelength ranges from soft-X ray to IR are needed. These developments are crucial for simulations and design of materials with tailored properties. In this seminar we would like to discuss these innovations for the development of novel materials and devices in semiconductor industries and nanotechnologies and how optical metrology can support these efforts.

9:00 – 9:15

Welcome and Introduction,
Norbert Esser, ISAS/TU Berlin, Michael Kolbe, PTB

9:15 – 9:45

Spectroscopic Ellipsometry for Thin Film Metrology in R&D and Industrial Applications,

Sven Peters (SENTECH Instruments)

9:45 – 10:15

Imaging Ellipsometry: Thin-Film Characterization on Micro-Structured Samples,

Matthias Duwe (Accurion)  

10:15 – 10:45



10:45 – 11:15

The Influence of each Polarimetric Measurement System on Depolarisation through Decoherence,
Kurt Hingerl (ZONA, JKU Linz)

11:15 – 11:45

Anisotropic Nanofibers studied by Infrared Polarimetry,

Karsten Hinrichs (ISAS)

11:45 – 12:15

Advanced Infrared Ellipsometric Techniques for Studies of Structured Materials,

Andreas Furchner (HZB)

12:15 – 13:45

Lunch Break & Exhibition


13:45 – 14:15

Soft X-Ray Scatterometry: At Resolution, 3D Metrology for the EUV Era

Sander Roobol (ASML)

14:15– 14:45

Optical Metrology for EUV-Lithography Optics

Anton Haase (ZEISS SMT)

14:45– 15:15

in-situ metrology during deposition and etching of semiconductor structures,

Christian Kaspari (Laytec)

15:15 – 15:45



15:45 – 16:15


Hybrid X-ray metrology for 1D and 3D nanostructures

Igor Makhotkin (Industrial Focus Group XUV Optics, MESA+ Twente)

16:15 – 16:45


Nanoscale grating characterization for investigations on stochastic roughness effects with a lab-based EUV spectrometer

Sven Glabisch (RWTH Aachen)

16:45– 17:15


Bayesian inferences assisted determination of optical constants: case studies on cobalt and its binary alloys,

Qais Sadeeh (PTB)

17:15– 17:30


Wrap up and end of meeting
Norbert Esser, ISAS/TU Berlin, Michael Kolbe, PTB