Logo of the Physikalisch-Technische Bundesanstalt

Influence of model errors on measurement uncertainties in EUV scatterometry

23.08.2010

PTB's scatterometry facilities enable the indirect measurement of critical structure quantities of lithographic masks with an accuracy in the nanometre range. To quantify the influence of the variation of model parameters on the measurement uncertainty, Monte Carlo simulations were performed as the measurements were evaluated. It turned out, especially for measurements performed with scattered light in the extreme ultraviolet wavelength range (~13.5 nm), that smal variations of the geometrical model parameters dominate the uncertainties of the reconstructed profile parameters. Furthermore, the model investigations show which characteristics of the masks are relatively stable against these systematic influences.

 

Contact:

[Translate to English:] « Zurück