Project

BMBF (Federal Ministry of Education and Research)

The scatterometrical measurements of PTB laboratories allow the indirect determination of the critical dimensions of lithographical masks in the nanometer range. The necessary mathematical modelling of the light diffraction and the reconstruction of the sought profile parameters of the illuminated masks from their light diffraction pattern are improved in cooperation with the Weierstrass Institute for Applied Analysis and Stochastics.  In addition, the measurement uncertainties of scatterometric methods are analyzed. This research is part of the joint project

• PTB Working Groups Ultra-high resolution microscopy & Quantitative microscopy 

• PTB Working Group EUV Radiometry

• Research Group Nonlinear Optimization and Inverse Problems, Weierstraß Institute for  Applied Analysis and Stochastics

Further information:  

     Inverse problem in scatterometry