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Mathematical modelling and evaluation of indirect measurements in scatterometry

05/2008 - 12/2010

The scatterometrical measurements of PTB laboratories allow the indirect determination of the critical dimensions of lithographical masks in the nanometer range. The necessary mathematical modelling of the light diffraction and the reconstruction of the sought profile parameters of the illuminated masks from their light diffraction pattern are improved in cooperation with the Weierstrass Institute for Applied Analysis and Stochastics.  In addition, the measurement uncertainties of scatterometric methods are analyzed. This research is part of the joint project

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