Funding
Scatterometry is an indirect method of measurement for the determination of surface profiles in the micrometer and nanometer range which occur e.g. in photolithographic masks. Within the scope of the BMBF joint project ABBILD, a mathematical method was developed in cooperation with the Weierstraß Institute of Berlin and two experimental PTB groups the basic suitability of EUV scatterometry for the determination of profiles was demonstrated.
Partners
- PTB Working Group Ultra-high resolution microscopy
Further information:
Inverse problem in scatterometry