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Mathematical methods for EUV scatterometry

06/2005 - 12/2007

Scatterometry is an indirect method of measurement for the determination of surface profiles in the micrometer and nanometer range which occur e.g. in photolithographic masks. Within the scope of the BMBF joint project ABBILD, a mathematical  method was developed in cooperation with the Weierstraß Institute of Berlin and  two experimental PTB groups the basic suitability of EUV scatterometry for the determination of profiles was demonstrated.

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