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Radiometry with Synchrotron Radiation

Department 7.1

Tasks

Application of synchrotron radiation in the THz, IR, UV, EUV, VUV, and soft X-ray spectral range at the electron storage rings Metrology Light Source (MLS) and BESSY II for basic and applied metrological tasks:

News

The announcement made by the large semiconductor manufacturers Samsung and TSMC in autumn 2018 that they are going to use EUV lithography for the manufacturing of high-end processors marks the commercial breakthrough of this technology after a long development phase. PTB has contributed to this development in metrological matters through its work at the synchrotron radiation sources BESSY II and...

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The significant challenges posed by the increasing complexity of nanostructured surfaces used in technological applications include the characterization of such surfaces. The importance of complex and multidimensional nanostructures consisting of several materials is particularly noticeable in the semiconductor industry. At PTB's laboratory at the BESSY II electron storage ring, synchrotron...

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PTB and ASML are putting a new test beamline into operation at BESSY

 

Increasing miniaturization in the microelectronic sector has created inevitable facts: In the future, structures on microchips and on other components will have to be manufactured by means of lithography in the EUV range, which means using extremely short wavelengths of just 13.5 nm. For test measurements, the...

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