In collaboration with the Advanced Mask Technology Center (AMTC), a new EUV photomask standard has been developed. Different parameters such as the structure width (CD), CD uniformity (CDU), pitch, height, sidewall angle, line edge/width roughness (LER/WR) etc. were calibrated accurately and traceably using 3D/CD-AFM and HR-TEM techniques. A measurement uncertainty for CD of 2.5 nm was obtained. The standard serves as a “golden standard” for several CD tools of the AMTC.
[ more ]