Scatterometry

References

	B. Bodermann, A. Diener, M. Wurm Dimensional optical metrology of deep subwavelength grating structures
	B. Bodermann, A. Diener, F. Scholze, S. Heidenreich, V. Soltwisch, M. Wurm OCD metrology for advanced lithography www.nist.gov/pml/div683/conference/
	M. Wurm, J. Endres, J. Probst, M. Schoengen, A. Diener, B. Bodermann Metrology of nanoscale grating structures by UV scatterometry DOI: doi.org/10.1364/OE.25.002460
	B. Bodermann, G. Ehret, A. Diener, D. Bergmann, M. Wurm Dimensional optical metrology on deep sub-wavelength nanostructures
	J. Endres, A. Diener, M. Wurm, B. Bodermann Investigations of the influence of common approximations in scatterometry for dimensional nanometrology Measurement Science and Technology 25(4), 044004 ( 2014) DOI: 10.1088/0957-0233/25/4/044004
	F. Scholze, B. Bodermann, S. Burger, J. Endres, A. Haase, M. Krumrey, C. Laubis, V. Soltwisch, A. Ullrich, J. Wernecke Determination of line profiles on photomasks using DUV, EUV and X-ray scattering 30th European Mask and Lithography Conference, Dresden, Germany, 24-25, June, 2014 30th European Mask and Lithography Conference; Proceedings of SPIE Volume 9231 (2014) , page 92310M-1 - 92310M-11 DOI: 10.1117/12.2065941 [CD-ROM] file name: 9231_16.pdf
	J. Endres, B. Bodermann, G. Dai, M. Wurm, M.-A. Henn, H. Gross, F. Scholze, A. Diener Preliminary comparison of DUV scatterometry for CD and edge profile metrology on EUV masks 7th International Workshop on Advanced Optical Imaging and Metrology, FRINGE 2013, Nuertingen, Germany, 08-11, September, 2013 Fringe 2013: 7th International Workshop on Advanced Optical Imaging and Metrology (2014) , page 695 - 700 DOI: 10.1007/978-3-642-36359-7_128
	J. Endres, N. Kumar, P. Petrik, M.-A. Henn, S. Heidenreich, S. Pereira, P. Urbach, B. Bodermann Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry SPIE Photonics Europe, Brussels, Belgium, 14-17, April, 2014 Optical Micro- and Nanometrology V; Proceedings of SPIE Volume 9132 (2014) , page 913208-1 - 913208-9 DOI: 10.1117/12.2052819
	J. Endres, S. Burger, M. Wurm, B. Bodermann Numerical investigations of the influence of different commonly applied approximations in scatterometry SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology IV, Munich, Germany, 10-14, May, 2013 Modeling aspects in optical metrology IV; Proceedings of SPIE Volume 8789 (2013) , page 878904-1 - 878904-9 DOI: 10.1117/12.2022108 [CD-ROM] file name: 8789_3.pdf
	M.-A. Henn, S. Heidenreich, H. Gross, B. Bodermann, M. Baer The effect of line roughness on DUV scatterometry SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology IV, Munich, Germany, May 13, 2013 SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology IV, Proc SPIE Volume 8789 (2013) , page 87890U-1-87890U-6 DOI: 10.1117/12.2020761
	S. Heidenreich, M.-A. Henn, H. Gross, B. Bodermann, M. Baer Alternative methods for uncertainty evaluation in EUV scatterometry SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology IV, Munich, Germany, May 13-14, 2013 Modeling Aspects in Optical Metrology IV; Proceedings of SPIE Volume 8789 (2013) DOI: 10.1117/12.2020677 [CD-ROM] file name: 8789_29.pdf, 87890T-1 - 87890T-8
	B. Bodermann, J. Endres, H. Gross, M.-A. Henn, A. Kato, F. Scholze, M. Wurm Towards traceability in scatterometric-optical dimensional metrology for optical lithography 113. Jahrestagung der Deutschen Gesellschaft für angewandte Optik (DGaO113. Jahrestagung der Deutschen Gesellschaft für angewandte Optik (DGaO), Eindhoven, The Netherlands, 29, May - 02, June, 2007 DGaO-Proceedings Volume 113 (2012) Online only

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