Reference standards

References

	D. Bergmann, B. Bodermann, H. Bosse, E. Buhr, D. Gaoliang, R. Dixson, W. Haessler-Grohne, K. Hahm, M. Wurm Photomask linewidth comparison by PTB and NIST SPIE Conference on Scanning Microscopies, Monterey, USA, 29, September - 01, October, 2015 Scanning Microscopies 2015 ; (Proceedings of SPIE Volume 9636 (2015) , page 96360S-1 - 96360S -14 DOI: 10.1117/12.2199453
	E. Agocs, B. Loechel, F. Scholze, B. Bodermann, G. Dai, J. Endres, J. Probst, L. Nielsen, M. Wurm, S. Burger, P.-E. Hansen, M. Krumrey, M. H. Madsen, S. Heidenreich, V. Soltwisch Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing Optics and Photonics 2015, San Diego, USA, 09-13, August, 2015 Nanoengineering: Fabrication, Properties, Optics, and Devices XII ; Proceedings of SPIE Volume 9556 (2015) DOI: 10.1117/12.2190409 [CD-ROM] file name 9556_38.pdf, 955610-1 - 955610-12Copyright: SPIE, The International Society for Optical Engineering
	B. Bodermann, B. Loechel, F. Scholze, J. Endres, J. Probst, M. Wurm, M. Schoengen, M. Krumrey, S. Burger, V. Soltwisch Development and characterisation of scatterometry reference standards. Frontiers of Characterization and Metrology for Nanoelectronics 2015, Dresden, Germany, 14-16, April, 2015 Frontiers of characterization and metrology for nanoelectronics 2015 (2015) , page 125-127
	B. Bodermann, B. Loechel, F. Scholze, G. Dai, J. Wernecke, J. Endres, J. Probst, M. Schoengen, M. Krumrey, P.-E. Hansen, V. Soltwisch Development of a scatterometry reference standard SPIE Photonics Europe, Brussels, Belgium, 14-17, April, 2014 Optical Micro- and Nanometrology V ; Proceedings of SPIE Volume 9132 (2014) DOI: 10.1117/12.2052278 91320A-1 - 91320A-12
	B. Bodermann, P.-E. Hansen, S. Burger, M.-A. Henn, H. Gross, M. Baer, F. Scholze, J. Endres, M. Wurm First steps towards a scatterometry reference standard SPIE Optics and Photonics 2012, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI, San Diego, Calif., USA, 12-16, August, 2012 Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI ; Proceedings of SPIE Volume 8466 (2012) DOI: 10.1117/12.929903 84660E-1 - 84660E-12
	B. Bodermann, D. Bergmann, E. Buhr, W. Haessler-Grohne, H. Bosse, J. Potzick, R. Dixon, R. Quintanilha, M. Stocker, A. Vladar, N. G. Orji Results of an international photomask linewidth comparison of NIST and PTB SPIE Conference on Photomask Technology 2009, Monterey, USA, 14-18, September, 2009 Photomask Technology 2009 ; Proceedings of SPIE on CD-ROM Volume 7488 (2009) DOI: 10.1117/12.831373 [CD-ROM] file name: 7488-51.pdf, 74881H-1 - 74881H-14
	J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, E. Buhr, W. Haessler-Grohne, B. Bodermann, C. G. Frase, H. Bosse International photomask linewidth comparison by NIST and PTB SPIE Conference on Photomask Technology 2008, Monterey, USA, 06-10, October, 2008 Photomask Technology 2008 ; Proceedings of SPIE on CD-ROM Volume 7122 (2008) DOI: 10.1117/12.801435 [CD-ROM] file name: 7122_97.pdf, 71222P-1 - 71222P-14
	J. Richter, T. Heins, R. Liebe, B. Bodermann, A. Diener, D. Bergmann, C. G. Frase, H. Bosse Calibration of CD mask standards for the 65 nm mode: CoG and MoS 23th European Mask and Lithography Conference EMLC (Former EMC), Grenoble, France, 22-25, January, 2007 EMLC 2007 : 23th European Mask and Lithography Conference ; Proceedings of SPIE Volume 6533 (2007) DOI: 10.1117/12.736931 [CD-ROM] file name: 6533_53.pdf, 65330S-1 - 65330S-10
	M. Arnz, W. Haessler-Grohne, B. Bodermann, H. Bosse Calibration of test masks used for lithography lens systems 22th European Mask and Lithography Conference EMLC (Former EMC), Dresden, Germany, 23-26, January, 2005 EMLC 2006 : 22th European Mask and Lithography Conference EMLC ; GMM-Fachbericht: 49 oder als Proc. SPIE 6281 (2006) , page 103-114
	F. Gans, R. Liebe, J. Richter, T. Schaetz, B. Hauffe, F. Hillmann, S. Doebereiner, H.-J. Brueck, G. Scheuring, B. Brendel, L. Bettin, K.-D. Roeth, W. Steinberg, G. Schlueter, P. Speckbacher, W. Sedlmeier, T. Scherübl, W. Haessler-Grohne, C. G. Frase, S. Czerkas, K. Discherl, B. Bodermann, W. Mirandé, H. Bosse Results of a round robin measurement on a new CD mask standard 21th European Mask and Lithography Conference EMLC (Former EMC), Dresden, Germany, 31, January - 03, February, 2005 EMLC 2005 : 21th European Mask and Lithography Conference EMLC (former EMC) ; GMM-Fachbericht Volume 45 (2005) , page 109-119
	W. Haessler-Grohne, C. G. Frase, S. Czerkas, K. Dirscherl, B. Bodermann, W. Mirandé, G. Ehret, H. Bosse Calibration procedures and application of the PTB photomask CD standard 25th Annual BACUS Symposium Photomask Technology, Monterey, USA, 04-07, October, 2005 BACUS Symposium on Photomask Technology 2005 and Photomask Japan ; Proceedings of SPIE Volume 5992 (2005) , page 159
	C. G. Frase, B. Bodermann, W. Haessler-Grohne, S. Czerkas, H. Bosse, W. Mirandé Metrologische Charakterisierung von neu entwickelten Photomasken-Strukturbreiten-Normalen PTB-Mitteilungen 114(1), 36-43 ( 2004)

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