Modelling

References

	S. Heidenreich, H. Gross, M. Wurm, B. Bodermann, M. Baer The statistical inverse problem of scatterometry: Bayesian inference and the effect of different priors SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology V, Munich, Germany, 22-25, June 2015 Modeling Aspects in Optical Metrology V; Proceedings of SPIE Volume 9526 (2015) , page 95260U DOI: 10.1117/12.2185707
	S. Burger, L. Zschiedrich, J. Pomplun, F. Schmidt, B. Bodermann Fast simulation method for parameter reconstruction in optical metrology SPIE Metrology, Inspection, and Process Control for Microlithography XXVII, San Diego, Calif., USA, 24-28, February, 2013 Metrology, inspection, and process control for microlithography XXVII; Proceedings of SPIE Volume 8681 of 1 (2013) , page 868119-1 - 868119-7 DOI: 10.1117/12.2011154
	M.-A. Henn, H. Gross, F. Scholze, M. Wurm, C. Elster, M. Baer A maximum likelihood approach to the inverse problem of scatterometry Optics Express 20(12), 12771 - 12786 ( 2012) DOI: 10.1364/OE.20.012771
	H. Gross, M.-A. Henn, A. Rathsfeld, F. Scholze, B. Bodermann, M. Baer Investigations on model-based uncertainties for the reconstruction of 2D periodic surface profiles in scatterometry 7th EOS Topical Meeting on Diffractive Optics 2010, Koli, Finland, 14-18, February, 2010 EOS Topical Meeting on Diffractive Optics 2010 (2010) [CD-ROM] file name: Koli Gross Hermann 2483.pdf, 2 S.
	H. Gross, R. Model, F. Scholze, M. Wurm, B. Bodermann, M. Baer, A. Rathsfeld Modellbildung, Bestimmung der Messunsicherheit und Validierung für diskrete inverse Probleme am Beispiel der Scatterometrie Sensoren und Messsysteme 2008 : 14. Fachtagung Ludwigsburg; VDI-Berichte 2011, 337 - 346 ( 2008) (VDI-Berichte: 2011)
	R. Model, A. Rathsfeld, H. Gross, M. Wurm, B. Bodermann A scatterometry inverse problem in optical mask technology Journal of Physics: Conference Series 135 ( 2008) DOI: 10.1088/1742-6596/135/1/012071 012071, 8 S.
	R. Model, A. Rathsfeld, H. Gross, M. Wurm, B. Bodermann A scatterometry inverse problem in optical mask technology 6th International Conference on Inverse Problems in Engineering, Dourdan, France, 15-19, June, 2008 Proceedings of ICIPE 2008 (2008) , page Paper 77
	G. Ehret, B. Bodermann, M. Woehler Comparison of rigorous modelling of different structure profiles on photomasks for quantitative linewidth measurements by means of UV- or DUV-optical microscopy Modeling Aspects in Optical Metrology, Munich, Germany, 18-19, June, 2007 Modeling aspects in optical metrology : [papers from the SPIE Conference on Optical Metrology, held as part of the 18th International Congress on Photonics in Europe]; Proceedings of SPIE Volume 6617 (2007) , page 661710-1 - 661710-11 DOI: 10.1117/12.726340
	B. Bodermann, H. Bosse An approach to validation of rigorous modeling in optical CD microscopy by comparison of measurement results with independent methods Modeling Aspects in Optical Metrology, Munich, Germany, 18-19, June, 2007 Modeling aspects in optical metrology : [papers from the SPIE Conference on Optical Metrology, held as part of the 18th International Congress on Photonics in Europe]; Proceedings of SPIE Volume 6617 (2007) , page 66170Y-1 - 66170Y-10 DOI: 10.1117/12.728896
	H. Gross, R. Model, M. Baer, M. Wurm, B. Bodermann, A. Rathsfeld Mathematical modelling of indirect measurements in scatterometry Measurement 39(9), 782 - 794 ( 2006) DOI: 10.1016/j.measurement.2006.04.009
	B. Bodermann, G. Ehret Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation Nano- and Micro-Metrology Conference, Munich, Germany, 13.-17. June 2005 Nano- and Micro-Metrology;(Proceedings of SPIE Volume 5858 (2005) , page 09-1 - 09-12
	B. Bodermann, G. Ehret, W. Mirandé Comparison of different microscope imaging models for different structure ge-ometries on the basis of rigorous diffraction calculation 106. Jahrestagung der Deutschen Gesellschaft für angewandte Optik (DGaO), Breslau, Poland, 17-21, May, 2005 DGaO-Proceedings (2005) , page A29 (online only)