Logo of the Physikalisch-Technische Bundesanstalt

Quantitative Microscopy

Working Group 4.22

Working subject: Calibration of linewidths on photomasks with light-optical procedures

Publications

  • B. Bodermann, Bernd, R. Köning, D. Bergmann, E. Buhr, W. Häßler-Grohne, J. Flügge, H. Bosse: "The road towards accurate optical width measurements at the industrial level", Proc. SPIE 8788 (2013), 87881S-1 - 87881S-12
  • B. Bodermann, E. Buhr, Z. Li, H. Bosse: Quantitative optical microscopy at the nanoscale: new developments & comparisons, in: Optical Imaging and Metrology: Advanced Technologies, W. Osten, N. Reingand (Eds.), Wiley-VCH, Weinheim, 255-282 (2012)
  • B. Bodermann, D. Bergmann, E. Buhr, W. Häßler-Grohne, H. Bosse, J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, N. Orji: Results of an international photomask linewidth comparison of NIST and PTB, Proc. SPIE 7488, 74881H (2009)
  • B. Bodermann, E. Buhr, G. Ehret, F. Scholze, M. Wurm: Optical metrology of micro- and nanostructures at PTB: Status and future developments, in: Quan, Chenggen (Hrsg.): Ninth International Symposium on Laser Metrology, Proceedings of SPIE 7155, 7155_30 (2008)
  • B. Bodermann, H. Bosse: Model based reference metrology for dimensional characterization of micro- and nanostructures, Optoelectronics Letters 4, 81 - 85 (2008)
  • J. Richter, F. Gans, T. Heins, R. Liebe, B. Bodermann, A. Diener, D. Bergmann, C.G. Frase, H. Bosse: Calibration of CD mask standards for the 7x node: CoG and MoSi, 23th European Mask and Lithography Conference EMLC 2007, Proc. SPIE 6533, 65330S-1 - 65330S-10 (2007)
  • W. Häßler-Grohne, C.G. Frase, S. Czerkas, K. Dirscherl, B. Bodermann, W. Mirandé, G. Ehret, H. Bosse: Calibration procedures and application of the PTB photomask CD standard, in: Weed, J. Tracy (Hrsg.): BACUS Symposium on Photomask Technology 2005 and Photomask Japan., Proc. SPIE 5992,  599240-1 - 599240-12 (2005)
  • W. Mirandé, B. Bodermann, W. Häßler-Grohne, C.G. Frase, S. Czerkas, H. Bosse: Metrological Characterisation of new CD photomask standards, Proc. SPIE 5504, 146-157 (2004)
  • B. Bodermann, E. Buhr, W. Mirandé: Quantitative Mikroskopie: Dimensionelle Messtechnik an Mikro- und Nanostrukturen, PTB-Mitteilungen 113, 337-345 (2003)