
Metallic devices containing tunnel junctions with sub-µm dimensions are fabricated by electron-beam-lithography in our clean room center.
The most important methods for the fabrication of devices, showing single charge effects (Single Electron Tunneling), are:
- Angle evaporation with shadow-masks
- Standard shadow evaporation
- Four-angle shadow evaporation to create very small islands
- Shadow evaporation for refractory materials like niobium