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Scatterometry - from science to production

Author(s): Jan Richter, Albrecht Ullrich, Bernd Bodermann and John C. Lam
Editor: Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Buhr, Egbert; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Report type: PTB-Report
Year: 2009
Pages: [CD-ROM] file name: 13_Richter_AMTC.pdf
ISBN: ISBN 978-3-86918-032-8
Abstract: Scatterometry has been around for several years in the semiconductor industry and exhibited promising potential. This paper guides through the process of a technology with potential to the realisation of customer defined measurements, which is from pure science to product. The potential of scatterometry for characterisation of photomasks is shown in comparison to standard CD SEM technology. In contrast the current application in the manufacturing environment are presented. The gaps in utilisation of the potential and path forward are discussed for a wider spread of the technology.
Note: Scatterometry and ellipsometry on structured surfaces : Beiträge des 245. PTB-Seminars am 18. und 19. März 2009 ; (PTB-Bericht PTB-Opt-71)

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