Improved orientation of wafers
PTB-News 1.2018
20.01.2017
The figure shows rotationally symmetric grooves with a continuous color gradient on a wafer.
For the exact processing of silicon wafers, it is necessary to identify the orientation of the crystal within the silicon wafer. An invention by PTB has improved the determination of the crystal orientation in <110>-wafers by additionally detecting incident light on special structures (see figure). These test structures are positioned on the surface and have enabled an automated determination process for the first time . This allows the crystalorientation to be determined with exceptional accuracy, so that the wafers can be oriented more precisely for the machine tools used. Moreover, this method can easily be integrated into existing facilities. (Technology Offer 0436)
Advantages
allows the crystal orientation to be determined with excellent accuracy
determination of the crystal orientation can be automated
easy to integrate
Contact person for questions about technology transfer
Andreas Barthel, Phone: +49 531 592-8307, andreas.barthel(at)ptb.de, 
www.technologietransfer.ptb.de/en