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Cooperation with industry at the Metrology Light Source

Especially interesting for
  • the semiconductor industry

PTB has extended its existing measurement capabilities at the Berlin synchrotron radiation facility BESSY II by an EUV beamline at PTB‘s own Metrology Light Source (MLS) in order to meet the growing need for high-end measurements for the at-wavelength characterization of lithography lens systems in the extreme UV (EUV, working wavelength: 13.5 nm). This measure has taken place in connection with new agreements in the field of EUV lithography (EUVL), in particular between Carl Zeiss SMT GmbH and PTB, with the objective of further intensifying the cooperation (which has been running since 1998) within the next four years. Carl Zeiss supplies the optical lens systems for ASML, the Dutch market leader when it comes to lithography machines used to manufacture computer chips and other microelectronic components.

920 km optical fibre link used to transmit the frequency from a PTB laser located in Braunschweig to the Max Planck Institute of Quantum Optics in Garching, near Munich.

The MLS is an electron storage ring located in the immediate vicinity of BESSY II, in Berlin-Adlershof; it belongs to PTB and has been in operation since 2008. The MLS supplies synchrotron radiation in the spectral range from 1 THz to the EUV range. In the EUV range, i. e. in the wavelength range around 13.5 nm, the measurement capabilities of the MLS and of BESSY II (where PTB also makes massive use of X-rays) overlap. The EUV beamline at the MLS (#3 in the figure) has been in operation since mid-2011 and – after a test phase – has, since the beginning of this year, been increasingly used for measurements within the scope of research cooperations, in particular for EUVL. In the near future, high-end computer chips will be manufactured using EUVL. For mid-2013, also PTB‘s largescale EUV reflectometer is planned to be transferred from BESSY II to the MLS; an EUV scatterometer/ellipsometer – optimized for scattering measurements in particular – is to take its place. With the new beamline, PTB has a total of approx. 6,000 hours of measurement time per year at its disposal for EUV metrology.

Also in other areas, PTB has clearly extended its measurement capabilities in the field of „metrology with synchrotron radiation“ over the course of the year by commissioning new beamlines at the MLS. Compared to its predecessor at BESSY II, a new measuring set-up for the calibration of radiation sources now also allows measurements to be carried out at wavelengths below 40 nm. Calibrated radiation sources in the vacuum-UV (VUV) and the EUV are, for example, of great importance for the characterization of space telescopes for solar and atmospheric research. A new undulator beamline provides monochromatized intensive and highly polarized radiation from the IR range up to the EUV range. At present, the first quantitative investigations of surfaces are being carried out by means of UV/VUV ellipsometry and electron spectroscopy together with partners from the research site Adlershof. Furthermore, a new near-field microscope has been put into operation at the infrared beamline of the MLS.

With the new beamlines and measuring stations at the MLS, PTB has, again, clearly extended the spectrum of measurement capabilities at its disposal for metrology with synchrotron radiation for EUV radiometry, source calibration, undulator radiation and IR near-field microscopy.


Frank Scholze
Department 7.1 Radiometry with Synchrotron Radiation
Phone: +49 (0)30 3481-7120