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EOS School of Physics on Optical Metrology

Also this year the EOSAM will host a School of Physics on optical metrology, now arrived at its 3rd edition. This year the school is organized within the framework of the project BeCOMe Opens external link in new windowhttps://www.ptb.de/empir2018/nc/become/home/, funded by the European Metrology Programme for Innnovation and Research (EMPIR). Registered participants will have the chance to attend lectures given by experts from academia, industry and national metrology institutes and the goal will be to outline the importance of optical measurement methods in our current society, especially to what concerns nanotechnologies.


Opening 9:45 h, (Omar El Gawhary, coordinator of the project BeCOMe)

Lecture #1 - 10:00 h – 11:30 h, Arie den Boef, Free University Amsterdam/ARCNL and ASML Fellow, The Netherlands: Optical wafer metrology concepts in advanced lithography

Lecture #2 - 14:00 h – 15:30 h, Ivano Ruo Berchera, Istituto Nazionale di Ricerca Metrologica (INRiM), Italy: Quantum metrology and Imaging with photons 

Lecture #3 - 16:00 – 17:30 h, Stefanie Kroker, Technische Universität Braunschweig and Physikalisch-Technische Bundesanstalt (PTB), Germany: Resonant nanophotonics systems for high-precision optical metrology

Opens external link in new windowhttps://www.europeanoptics.org/pages/events/eosam2020/program/physics-school.html