| Titel: |
Challenges in nanometrology: high precision measurement of position and size |
| Autor(en): |
H. Bosse, B. Bodermann, G. Dai, J. Fluegge, C. G. Frase, W. Haessler-Grohne, P. Koechert, R. Koening, C. Weichert |
| Jahr: |
2014 |
| Buchtitel: |
58th IWK, Ilmenau Scientific Colloquium: Proceeding |
| Seite(n): |
15 |
| Veranstaltungsname: |
58th IWK - Ilmenau Scientific Colloquium: Shaping the Future by Engineering |
| Veranstaltungsort: |
Ilmenau, Germany |
| Veranstaltungsdatum: |
08-12,September, 2014 |
| Zusammenfassung: |
This contribution describes recent developments of the PTB in high precision position and size metrology as support for different nanotechnology applications. It will be shown how measurement uncertainties of about 1-2 nm for 1D-position of graduation lines on 152 mm photomasks (6’’), or on line scales and incremental encoders of about 300 mm length have been achieved. The measurement of the size of nanoscale features represents additional challenges, because in addition to the length metric, also the location of opposite feature edges has to be precisely determined. In addition to other feature size or CD metrology techniques applied at PTB, a recent development which uses transmission electron microscopy in the traceability chain of AFM CD measurements will be described. The uncertainties achieved for CD measurements on high quality Si line structures are U95% = 1.6 nm. |
