| 1a |
IR undulator radiation, IR bending magnet edge radiation |
0.6 µm to 20 µm |
operating |
| |
Compton-backscattering (electron energy measurement, laser) |
|
operating |
| 1b |
deflected undulator radiation (high flux experiments) |
|
operational 2010 |
| 1c |
direct undulator radiation, Compton-backscattering (electron energy measurement, detector) |
|
operating |
| 1d |
UV/VUV monochromator for undulator radiation |
4 nm to 400 nm |
operational 2010 |
| 2a |
direct bending magnet radiation (calculable photon flux) |
|
operating |
| 2b |
UV/VUV monochromator (source calibration) |
7 nm to 400 nm |
operational 2010 |
| 3 |
EUV plane grating monochromator (reflectometry) |
4 nm to 40 nm |
operational 2009 |
| 4 |
UV/VUV monochromator (source calibration) |
40 nm to 400 nm |
operating |
| 5 |
THz beamline |
0.6 µm to 8 mm |
operational 2009 |
| 6 |
IR beamline |
0.6 µm to 8 mm |
operating |
| 7 |
diagnostics frontend |
|
operating |