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Arbeitsgruppe 5.22
Mask Metrology
 
- Masks in Lithography
- Research Items
- Instrumentation
Calibration Services
- Literature
- Staff/Contact

Calibration services of section 5.22

1D- and 2D-precision graduations:

Precision line scales, masks, microstructures

Measurand / measurement object

Measurement procedure/Measaurement device

Measurement range

Measurement uncertainty (k=2)
Q[a; b] is short for Ö (a²+b²)

Graduation length of line scales

LMS 2020

Up to 280 mm

Q[10; 0,15L] in nm;L in mm

Graduation length of microscope scales

LMS 2020

Up to 10 mm

50 nm

2D-positions of microstructures on masks

LMS 2020

Up to 200 mm
(9 inch)

Q[10; 0,2L] in nm; L in mm

Deviations from nominal grid positions of microstructures on masks

LMS 2020

Up to 200 mm
(9 inch)

10 nm

Width of microstrucures, measured with optical detection in reflection mode

LMS 2020

> 0,5 µm

> 50 nm

Width of microstructures, SEM measurement

EOMS

> 0,1 µm

> 20 nm

Mean pitch of microstructure graduations

EOMS

Mean pitch > 100 nm

> 1 nm


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Page created: 2003-07-01, last update: 2007-09-18