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Arbeitsgruppe 5.22
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Mask Metrology
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Research items
Dimensional metrology with the scanning electron microscope (SEM):
- Development of application specific edge detection algorithms
- Investigations to characterize the adjustment state of a SEM
- Investigations to characterize the metrological state of SEM scan generators
Optical length and x-y-Coordinate measurements of flat samples:
- Nano3: International Comparison of line scales
- Investigations of transferability of structure widths (critical dimension)
- High presicion transfer of length scale in one and
two dimensional objects
- Investigation of standards to determine lithographic minaturization
Scanning probe microscopy on planar measuring objects:
- Metrological features of Nanostation 300
- Development of edge sensitive measurement procedures
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© Physikalisch-Technische Bundesanstalt
Page created: 2007-05-09, last update: 2007-09-17, Harald Bosse / Dorothee Hüser
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