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Working Group 5.15

Calibration of Roughness Parameters

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Messeinrichtungen und Normale

Nanostep  RMA  Micromap  Concept  T8000  Area tester  S8P  QZM  Axioplan

Depth-setting standards  Area tester  Development of calibration standards

Messeinrichtungen

Taylor Hobson Nanostep
	Tactile measuring system, profilometer Horizontal measuring length 50 mm, measuring range: 12 µm Dynamic noise Rz < 3 nm,  static noise Rz < 1 nm Max. resolution vertical: 0.03 nm, horizontal: 50 nm Static measuring force adjustable from 10 µN to 700 µN Evaluation software UBM and PTB-Reference Software RPTB
Mahr Perthometer Concept, PGK
	Tactile measuring system, profilometer Drive unit PGK-20, tracing length 20 mm Pick-up, RFHTB-50, RFHTB-250, MFW-250 Dynamic noise < 8 nm,  static noise Rz < 2 nm Max. resolution vertical: 1 nm, horizontal: 100 nm Static measuring force 0.6 mN, 1 mN Evaluation software Mahr and PTB-Reference Software RPTB
Mahr Perthometer Concept, PRK
	Tactile measuring system, profilometer Drive unit PRK, tracing length 60 mm Pick-up, RFHTB-50, RFHTB-250, RFHTB-750 Dynamic noise Rz < 20 nm, static noise < 3 nm Max. resolution vertical: 1 nm, horizontal: 100 nm Static measuring force approx. 1 mN Evaluation software Mahr and PTB-Reference Software RPTB
Mahr S8P
	Tactile measuring system, profilometer Drive unit FTK, tracing length 20 mm Taster, FTK3-50 Dynamic noise Rz < 5 nm, static noise Rz < 2 nm Max. resolution vertical: 1 nm, horizontal: up to 40000 points Static measuring force approx. 1 mN Evaluation software Perthen and PTB-Reference Software RPTB
Mahr + PTB Rauheitsmessanlage (RMA)
	Tactile measuring system, profilometer Basic device: Perthen C5D Drive unit PMK, tracing length 20 mm Pick-up, FTK3-50 Dynamic noise Rz < 5 nm, static noise Rz < 3 nm Max. resolution vertical: 1 nm, horizontal: 200 nm Static measuring force approx. 1 mN Control and data transfer with software elaborated at PTB Evaluation software PTB and PTB-Reference Software RPTB
Hommel Werke T8000
	Tactile measuring system, profilometer Drive unit LV-50, tracing length 50 mm Pick-up TKL 100/17, TKL 300/17, TKPK 100 Dynamic noise < 18 nm, static noise Rz < 3 nm Max. Max. resolution vertical: 1 nm horizontal: 9600 points Static measuring force approx. 1 mN Evaluation software Hommel and PTB-Reference Software RPTB
Quantix Zeiss Measuring System (QZM)
	Linnik interference microscope with exchangeable reference plane (R = 10%, 30%, 90%) Illumination with Tl spectral lamp Cooled camera with 1300 x 1000 Pixel Evaluation with carrier frequency procedure Measuring range vertical 10 µm, horizontal 640 µm x 500 µm Noise Rz = 2 nm Measurement uncertainty of step height between 2 nm and 9 nm depending on step height Application: Reference instrument for Depth-setting standards
Atos Interference microscope Micromap
	Interference microscope with phase shifting and white light mode Objectives 2,5x to 50x and DIC 10x Field of view 160 µm x 120 µm to 3.2 mm x 2.4 mm Camera with 640 x 480 Pixel Vertical measuring range: white light 1 mm, phase shifting 50 µm Noise Rz = 0.8 nm Measurement uncertainty 3 nm Application: Topography measurements on particularly smooth surfaces
Zeiss Flächenprüfer
	Fizeau interferometer with exchangeable reference plane (R = 4%, 50%, 90%) Flatness error of the reference mirrors < λ/10 Illumination with Tl spectral lamp Field of view diameter 50 mm Application: Qualitative documentation of the surface of measurement objects
Zeiss Research microscope Axioplan
	Universal reflected light microscope DIC objectives 5x to 100x Camera with up to 3000 x 2000 Pixel Field of view from 68 µm x 86 µm to 2.8 mm x 3.5 mm Application: Qualitative documentation of the surface of measurement objects

Measurement standards
Depth-setting standards

Wide grooves with flat bottoms
SMU
	Dissemination unit of length, vertical direction Range of application: Profilometer, interference microscopes, confocal microscopes Range of representation: 60 nm to 3000 nm Calibration uncertainty U > 3 nm (k=2) Profil:
VLSI
	Grating etched in Si with vertical flanks Application: Determination of the horizontal resolution capability of optical surface measurement procedures Chip size 10 mm x 10 mm on glass substrate 40 mm x 40 mm Range of representation: Four fields with periods from 6 µm to 200 µm with constant depth on one chip Depths of approx. 90 nm and 16 µm Profil:
Wide grooves with rounded bottoms
Depth-setting standard with 1 to 6 grooves
	Dissemination unit of length, vertical direction Range of application: Profilometer, interference microscopes, confocal microscopes Range of representation: 200 nm to 10000 nm Calibration uncertainty U > 3 nm (k=2) Profil:

Roughness standards

Groove spacing standards
Mahr PGN
	Calibration of vertical and horizontal profile components Range of application: Profilometer Range of representation: vertical 200 nm <Rz< 10000 nm, horizontal 100 µm < RSm < 200 µm Calibration uncertainty: vertical U ≥ 1*10-2 x calibration quantity (k=2) horizontal U ≥ 200 nm (k=2) Profil:
Lateral standard
	Calibration of horizontal axis Range of application: Profilometer Range of representation: 10 µm < RSm < 2500 µm Calibration uncertainty: U ≥ 200 nm (k=2) Profil:
Standards with irregular profile
Profiles irregular in one direction (ground roughness standards)
	Characterization of the whole transfer range Application: Profilometer, confocal microscopes, interference microscopes Range of representation: 150 nm < Ra < 4000 nm, 1000 nm < Rz < 20000 nm Calibration uncertainty: U ≥ 1*10-2 calibration quantity (k=2) Profil:
Circular irregular profiles (turned roughness standards)
	Characterization of the whole instrument transfer chain Application: Profilometer, confocal microscopes, interference microscopes Range of representation: 20 nm < Ra < 80 nm, 150 nm < Rz < 450 nm Calibration uncertainty: U ≥ 1*10-2 calibration quantity (k=2) Profil:
Trapezoidal depth-setting standard with 6 trapezoidal grooves
	Grooves turned in amorphous Ni layer on plane Ni base Dissemination unit of length, vertical direction Application: Profilometer, interference microscopes, confocal microscopes Range of representation: 6 grooves from 0.24 µm to 75 µm Roughness of the surface approx. Rz = 15 nm Calibration uncertainty U > 2 nm (k=2) Profil:
Resolution standard
	Gratings etched in Si with vertical flanks Application: Determination of the lateral resolution capability of optical surface measurement instruments Chip size 10 mm x 10 mm on glass substrate 40 mm x 40 mm Range of representation: Eight fields with periods from 4 µm to 800 µm with constant depth on one chip Depths of approx. 90 nm and 4 µm available

Development of calibration standards

Geometrical standards
function	Calibration of the vertical and horizontal measurement system of contact stylus instruments
specifications	Manufactured by single diamond turning Pure sinusoidal profile (type C nach ISO 5436-1) DLC-(„Diamond like Carbon“) covering for increased resistance to wear and reduction of friction Layout of proven „Halle“-roughness calibration standards Useable width of profile about 5 mm 3 different types with the following nominal values: type use for cutoff in mm amplitude Pt in µm period in µm peakcount PC per cm profile length acc. ISO 4288 in mm realised length of profile in mm fine 0.25 0.4 50 200 1.25 4 medium 0.8 3 140 71 4.0 8 coarse 2.5 15 450 22 12.5 20
Chirp-standard
function	Testing of the transfer behaviour of surface measuring instruments by a set of different spatial wavelengths
specifications	Wavelengths from 10 µm to 91 µm Wavelength change steps of about 10% 24 wavelentgh values (according to „E-24-series“) constant amplitude (Pt) of 1 µm At wavelength 10 µm: smallest curvature about 5 µm maximum slope about 0.3 rad At wavelength 91 µm: biggest curvature about 300 µm smallest slope ca. 0.04 rad
	Figure 1: section of Chirp-standard