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Tasks Investigation and development of ultra-high resolution optical measurement methods for traceable dimensional measurements of micro- and nanostructures on surfaces with structure sizes down to the sub-100 nm range. Research and development of optical microscopy methods with the aim of increasing the lateral resolving power beyond the limits of classical microscopy (Abbe limit). Investigation and modelling of the interactions of nano-scale structures with electromagnetic radiation in terms of applications for ultra-high resolution measurement methods. Development of dimensional optical measuring techniques for current and future 193nm technologies in particular in semiconductor industry. Fields of work Goniometric Scatterometry and Ellipsometry for dimensional measurements of periodic structures Development of a high resolution 193 nm microscope for linewidth measurements Research and development of novel superresolving dark field techniques Further development of rigorous models for microscopy and scatterometry Current projects  Contact
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