Nanostructures for Technical Applications

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Equipment

Scanning-Electron-Microscope and 200 kV-Transmission-Electron-Microscope (TEM) with scanning unit (STEM), both using a field emission source and energy dispersive x-ray microanalysis Digital image processing system Sample-preparation (TEM and STEM)  Sputter- and Evaporationsystems		TEM
Scanning-Electron-Microscope Zeiss Supra 40		Supra 40
E-beam writer (Vistec, type EBPG-5000+, beam energy 20, 50 or 100 keV		EBPG 5000+
E-beam writer (Leica, type LION LV1), beam energy 0.5 -20 keV		LION LV1