Publication single view


The effect of line roughness in DUV scatterometry

Author(s): M.-A. Henn, S. Heidenreich, H. Gross, B. Bodermann and M. Baer
Journal: Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV
Year: 2013
Month: May
Day: 13
Event name: Modeling Aspects in Optical Metrology IV
Event place: Munich, Germany
Event date: May 13, 2013
DOI: 10.1117/12.2020761
Abstract: The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.

Back to the list view