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Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle

Author(s): V. Soltwisch, S. Burger and F. Scholze
Journal: Proc. SPIE
Year: 2013
Month: May
Day: 13
Volume: 8789
Issue: Modeling Aspects in Optical Metrology IV
DOI: 10.1117/12.2020487
Abstract: Extreme W scatterometry using radiation in the extreme ultraviolet photon energy range, with wavelengths around 13.5 nm, provides direct information on the performance of EUV optical components, e.g. EUV pho­ tomasks, in their working wavelength regime. Scatterometry with horizontal diffraction geometry, parallel to the grating lines (conical), and vertical scattering geometry, perpendicular to the lines (in-plane), was performed on EUV lithography mask test structures. Numerical FEM based simulations, using a rigorous Maxwell solver, compare both experimental set-ups with focus on the sensitivity of the diffraction intensities particularly with respect to the side wall angle. © (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

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