Physikalisch-Technische Bundesanstalt

2006 - 2005:

Karnutsch, C.; Gaertner, C.; Haug, V.; Lemmer, U.; Farrel, T.; Nehls, B. S.; Scherf, U.; Wang, Jing; Weimann, Thomas; Heliotis, G.; Pflumm, C.; DeMello, J. C.; Bradley, D. D. C.; Low threshold blue conjugated polymer lasers with first- and second-order distributed feedback; Applied Physics Letters: 89 (2006), 201108-1 - 201108-3

Rabe, T.; Gerlach, G.; Riedl, T.; Johannes, H.-H.; Kowalsky, W.; Wang, Jing; Weimann, Thomas; Hinze, Peter; Galbrecht, F.; Scherf, U.;Quasi-continuous-wave operation of an organic thin-film distributed feedback laser; Applied Physics Letters: 89 (2006), 8, 081115-1 - 081115-3

Riedl, T.; Rabe, T.; Johannes, H. H.; Kowalsky, W.; Wang, Jing; Weimann, Thomas; Hinze, Peter; Nehls, B.; Farrell, T.; Scherf, U.; Tunable organic thin-film laser pumped by an inorganic violet diode laser;Applied Physics Letters: 88 (2006), 241116-1 - 241116-3

Rabe, Torsten; Hoping, Matthias; Schneider, Daniel; Becher, Eike; Johannes, Hans-Hermann; Kowalsky, Wolfgang; Weimann, Thomas; Wang, Jing; Hinze, Peter; Nehls, Benjamin S.; Scherf, Ullrich; Farrell, Tony; Riedl, Thomas; Threshold reduction in polymer lasers based on poly(9,9-dioctylfluorene) with statistical binaphthyl units;Advanced Functional Materials: 15 (2005), 7, 1188 - 1192

Gölzhäuser, Armin; Eck, Wolfgang; Geyer, Wolfgang; Stadler, Volker; Weimann, Thomas; Hinze, Peter; Grunze, Michael;Chemical Nanolithography with Electron Beams; Advanced Materials: 13 (2001), 11, 806 - 809

Schneider, D.; Rabe, T.; Riedl, T.; Dobbertin, T.; Kröger, M.; Becker, E.; Johannes, H.-H.; Kowalsky, W.; Weimann, Thomas; Wang, Jing; Hinze, Peter; Organic solid-state lasers based on sexiphenyl as active chromophore; Journal of applied Physics: 98 (2005), 043104-1 - 043104-6

Spehr, T.; Siebert, A.; Fuhrmann-Lieker, T.; Salbeck, J.; Rabe, T.; Riedl, T.; Johannes, H. H.; Kowalsky, W.; Wang, Jing; Weimann, Thomas; Hinze, Peter; Organic solid-state UV-lasers based on spiro-terphenyl;Applied Physics Letters: 87 (2005), 161103-1 - 161103-3

Schneider, Daniel; Rabe, Torsten; Riedl, Thomas; Dobbertin, Thomas; Kröger, Michael; Becker, Eike; Johannes, Hans-Hermann; Kowalsky, Wolgang; Weimann, Thomas; Wang, Jing; Hinze, Peter; Gerhard, Anja; Stössel, Philipp; Vestweber, Horst; An ultraviolet organic thin-film solid-state laser for bio-marker applications; Advanced Materials: 17 (2005), 1, 31 - 34

2004 - 2003:

Schneider, Daniel; Rabe, Thorsten; Riedl, Thomas; Dobbertin, T.; Werner, O.; Kröger, M.; Becker, E.; Johannes, H.-H.; Kowalsky, Wolfgang; Weimann, Thomas; Wang, Jing; Hinze, Peter; Gerhard, A.; Stössel, P.; Vestweber, H.; Deep blue widely tunable organic solid-state laser based on a spirobifluorene derivative; Applied Physics Letters: 84 (2004), 23, 4693 - 4695

Schneider, D.; Rabe, T.; Riedl, T.; Dobbertin, T.; Kröger, M.; Becker, E.; Johannes, H.-H.; Kowalsky, W.; Weimann, Thomas; Wang, Jing; Hinze, Peter;Laser threshold reduction in an all-spiro guest-host system; Applied Physics Letters: 85 (2004), 10, 1659 - 1661

Schneider, D.; Rabe, T.; Riedl, T.; Dobbertin, T.; Kröger, M.; Becker, E.; Johannes, H.-H.; Kowalsky, W.; Weimann, Thomas; Wang, Jing; Hinze, Peter; Ultrawide tuning range in doped organic solid-state lasers; Applied Physics Letters: 85 (2004), 11, 1886 - 1888

Dragnea, B.;Szarko, J. M.; Kowarik, S.; Weimann, Th.; Feldmann, J.; Leone; S. R.: Near-Field Surface Plasmon Excitation on Structured Gold Films. In: Nanoletters, Vol. 3;(2003) 1; 3-7.

W. Jutzi, S. Wuensch, E. Crocoll, M. Neuhaus, T. A. Scherer, T. Weimann and J. Niemeyer: "Microwave and dc Properties of Niobium Coplanar Nanolines with 50 nm Linewidth on Silicon. In: IEEE Transactions on Applied Superconductivity, Vol 13. No. 2 June 2003, 320-323

Weimann, Th.; Hinze, P.; Wünsch, S.; Scherer, T. A.; Jutzi, W.; Niemeyer, J.: Superconducting Coplanar Nanolines with 50 nm Linewidth. In: Microelectronic Engineering 67-68, 2003, 363-368.

Schneider, D.; Hartmann, S.; Benstem, T.; Dobbertin, T.; Heithecker, D.; Metzdorf, D.; Becker, E.; Riedel, T.; Johannes, H. H.; Kowalsky, W.; Weimann, T.; Wang, J.; Hinze,P.: Wavelength-tunable organic solid-state distributed-feetback laser. In: Appl. Phys., Laser and Optics, B77, 399 - 402 (2003).  

2002 - 2001:

Wunsch, S.; Scherer, T. A.; Neuhaus, M.; Jutzi, W.; Weimann, T.; Niemeyer, J.: Measured quality factor and intermodulation product of CPW resonators on silicon substrates with 100 nm wide niobium lines at 17 GHz and 4.2 K. In: Physica C, 2002, Vol. 372, Part 1, pp. 478-481.

Weimann, T.; Geyer, W.; Hinze, P.; Stadler, V.; Eck, W.; Gölzhäuser, A.: Nanoscale Patterning of Self-assembled Monolayers by E-beam Lithography. In: Microelectronic Engineering: 57-58 (2001), 903 - 907

Weimann, T.; Scherer, H.; Krupenin, V. A.; Müller, F.; Niemeyer, J.: Four-angle evaporation method for the preparation of Single Electron Tunneling devices. In: Microelectronic Engineering: 57-58 (2001), 915 - 918

Scherer, H.; Weimann, T.; Zorin, A.; Niemeyer, J.: The effect of thermal annealing on the properties of Al-AlOx-Al single electron tunneling transistors. In: Journal of Applied Physics: 90 (2001), 5, 2528 - 2532

Yacoot, A.; Kuetgens, U.; Koenders, L.; Weimann, T.: A combined scanning tunnelling microscope and x-ray interferometer. In Measurement Science and Technology: 12 (2001), 10, 1660 - 1665  

2000 - 1999:

Scherer, H.; Weimann, Th.; Hinze, P.; Samwer, B. W.; Zorin, A. B.; Niemeyer, J.: All-chromium single-electron tunneling devices fabricated by direct writing multilayer techniques. In: Physica B 284-288 (2000), 1806-1807.

Weimann, Th.; Scherer. H.; Hinze. P.; Niemeyer. J.: Fabrication of Metallic Multilayer Single Electron Tunneling Devices using Low-energy E-beam Lithography. In: Microelectronic Engineering 53 (2000), 225-228.

Pöpel, R; Hagedorn, D; Weimann, Th.; Buchholz, FI; Niemeyer, J: Superconductor-normal metal-superconductor process development for the fabrication of small Josephson junctions in ramp type configuration. In: Superconductor Science & Technology, (2000), 13, 2, 148-153.

Gölzhäuser, A; Geyer, W; Stadler, V; Eck, W.; Grunze, M; Edinger, K; Weimann, Th; Hinze, P: Nanoscale patterning of self-assembled monolayers with electrons. In: J. Vac. Sci. Technol., (2000) , B 18, 3414

Scherer, H.; Weimann, T.; Lotkhov, S. V.; Scherer, R.; Hinze, P.; Samwer, B.; Niemeyer, J.; Zorin, A. B.: Einzelelektronentunneln - Mehrlagentechnologie für metallische Nanometerstrukturen. In Supraleitung und Tieftemperaturphysik: Tagungsband zum 7. Statusseminar 14. und 15. Dezember 2000 ; Berichte zu F&E-Arbeitsgruppeen aus dem Förderbereich Physikalische Technologien des Bundesministeriums für Bildung und Forschung: (2001), 572 - 575

Gölzhäuser, A. Geyer, W.; Stadler, V.; Eck, W.; Grunze, M.; Weimann, T.; Hinze, P.; Edinger, K.: Nanoscale Patterning Self-Assembled Monolayers with Electrons;. In: Journal of Vacuum Science and Technology B: 18 (2000), 6, 3414 - 3418

Weimann, Th.; Hinze, P.; Scherer, H.; Niemeyer, J: Fabrication of a Metalic Single Electron Tunneling Transistor by Multilayer Technique Using Lithography with a Scanning Transmission Electron Microscope. In: Microelectronic Engineering 46 (1999), S. 165-168.

Phillip, G.; Weis, J.; v. Klitzing, K.; Weimann, Th.; Hinze, P.: Shadow Evaporation Method for Fabrication of sub 10 nm Gaps between Metal Electrodes. Micro- and Nano-Engineering. In: Microelectronic Engineering 46 (1999), S. 157-160.

Pavolotsky, A. B.; Weimann, Th.; Scherer, H.; Krupenin; V. A.; Niemeyer, J.; Zorin, A.B.: Multilayer Technique for Fabricating Nb Junction Circuits Exhibiting Charging Effects. In: J. Vacuum Science & Techn. B 17 (1999), 230-232.

Lothkov, S. V.; Zangerle, H.; Zorin, A. B.; Weimann, Th.; Scherer, H.; Niemeyer, J.: Superconducting Electrometer Based on the Resistively Shunted Bloch Transistor. In: IEEE Trans. Appl. Supercond., 9 (1999), 3664-3667.

Pavolotsky, A. B.; Weimann, Th.; Scherer, H.; Krupenin; V. A.; Niemeyer, J.; Zorin, A.B.: Novel Method for Fabricating Deep Submicron Nb/AlOx/Nb Tunnel Junctions Based on Spin-on Glass Planarization. In: IEEE Trans. Appl. Supercond., 9 (1999), 3251-3254.

Dolata, R.; Weimann, T.; Scherer, H.; Niemeyer, J.: Sub µm Nb/AlOx/Nb Josephson Junctions Fabricated by Anodization Techniques. In: IEEE Trans. Appl. Supercond., 9 (1999), 3255-3258.

Krupenin, V. A.; Lothkov, S. V.; Scherer, H.; Weimann. Th.; Zorin, A. B.; Ahlers, F.-J.; Niemeyer, J.; Wolf, H.: Charging and heating effects in a system of coupled single-electron tunneling devices: In Phys. Rev. B 59 (1999), 778-784.

Scherer, H.; Weimann, Th.; Hinze, P.; Samwer, B. W.; Zorin, A. B.; Niemeyer, J.: Characterization of all-chromium tunnel junctions and single-electron tunneling devices fabricated by direct writing multilayer technique. In: Journal of Applied Physics, 86 (1999) 6956 - 6964.

Zorin, A. B.; Lothkov, S. V.; Pashkin, Yu. A.; Zangerle, H.; Krupenin, V. A.; Weimann, Th.; Scherer, H.; Niemeyer, J.: Highly Sensitive Electrometers Based on Single Cooper Pair Tunneling. In: Journal of Superconductivity 12 (1999), 747-755.  

1998 - 1997:

Weimann, Th.; Scherer, H.; Wolf, H.; Krupenin, V. A.; Niemeyer, J.: A New Technology for Metallic Multilayer Single Electron Tunneling Devices. In: Microelectronic Engineering 41/42 (1998), S. 559-562.

Wolf, H.; Ahlers, F.-J.; Niemeyer, J.; Scherer, H.; Weimann, Th.; Zorin, A.B.; Krupenin, V.A.; Lotkhov, S.V.; Presnov, D.E.: Investigation of the offset charge noise in single electron tunneling devices. In: IEEE Transactions on Instrumentation and Measurement 46, 303 (1997).

Weimann, Th.; Wolf, H.; Scherer, H.; Niemeyer, J.; Krupenin, V.A.: Metallic single electron devices fabricated using a multilayer technique. In: Applied Physics Letters, 71, 713-715 (1997).