Standards for micro- and nanometrology
In the micro- and nanometrology standards are in applied e.g. for the determination of the lateral magnification or the lateral resolution of a microscope. So called linewidth standards, i. e. linear structures with a well defined feature widths, are of particular importance. Such standards are required in particular in the semiconductor industry, where they are usally refered to as CD (critical dimension) standards.
For many applications chrome structures on glas- or quartz substrates are suitable standards. Such structures can be manufactured lithografically.
Together with other partners PTB has developed standrads for different application areas. In addition PTB offers a calibration service for customer standard samples.
The following standard samples have been developed and are available:
- Photomask CD standard
- Standard for optical microscopy
- Standard for UV- microscopy
- CD Standard for scatterometry