The working group is developing, investigating and applying ultra-high resolution optical measurement methods for measuring the size micro- and nanostructures on surfaces with structure sizes down to the sub-100 nm range.
These methods are required e. g. by the semiconductor industry for the lithographical manufacturing of electronic devices, in optics industries for the characterisation of diffractive optical elements and in the field of modern nanotechnologies.
The main goals are the improvement of the measurement accuracy and efficiency, and the development of optical measurement methods, which can measure even very tiny structures having sizes well below the classical resolution limit (Rayleigh limit) of optical microscopy.
This work aims to provide suitable metrological solutions to meet future requirements of the named industries as well as for fundamental research in nanotechnologies.
- Development and improvement of optical microscopic methods for dimensional characterisation of micro- and nanostructures:
- Angular dependent (goniometric) scatterometry for dimensional measurements of periodic micro- und nanostructure
- Development and calibration of reference structures: Standards for micro- and nanotechnology
- Angle dependend scattered light measurements (goniometric scatterometry) for dimensional measurement of periodic micro- and nanostructures
- Measurements of grating periods by means of optical diffraction
- Spectroscopic measurements of the polarising properties of structured surfaces to characterise the surface structures by means of spectroscopic ellipsometry and Mueller polarimetry
- Development of optical measurement methods to characterise structures of dimensions much smaller than the used optical wavelength:
Optical Sub-wavelength metrology or nanometrology, respectively
- Investigation and modelling of the interactions between nanoscale structures and electromagnetic radiation including different illumination detection and imaging properties of the different measurement systems and methods with respect to applications for ultra-high resolution metrology and in close cooperation with the PTB working group Modelling and Simulation
The working group is cooperating in research projects with international partners from
industry, universities, research institutes and metrology institutes.
The working group offers to calibrate the period of gratings within the range from 144 nm till about 10 µm by means of optical diffraction.
- Overview on standards for nanometrology
Linewidth calibrations on photomasks are offered also by an accredated laboratory (DAkkS) in collaboration with PTB:Vistec Electron Beam GmbH in Jena
- Member of the DGaO working group ‘Optische Sensorsysteme’
- Member of the ‘Arbeitskreis Ellipsometrie AKE - Paul Drude e. V.’