Physikalisch-Technische Bundesanstalt

• Tactile measuring system, profilometer
  
• Horizontal measuring length 50 mm, measuring range: 12 µm
  
• Dynamic noise Rz < 3 nm, 
  static noise Rz < 1 nm
  
• Max. resolution vertical: 0.03 nm, horizontal: 50 nm
  
• Static measuring force adjustable from 10 µN to 700 µN
  
• Evaluation software UBM and PTB-Reference Software RPTB

• Tactile measuring system, profilometer
  
• Drive unit PGK-20, tracing length 20 mm
  
• Pick-up, RFHTB-50, RFHTB-250, MFW-250
  
• Dynamic noise < 8 nm, 
  static noise Rz < 2 nm
  
• Max. resolution vertical: 1 nm, horizontal: 100 nm
  
• Static measuring force 0.6 mN, 1 mN
  
• Evaluation software Mahr and PTB-Reference Software RPTB

• Tactile measuring system, profilometer
  
• Drive unit PRK, tracing length 60 mm
  
• Pick-up, RFHTB-50, RFHTB-250, RFHTB-750
  
• Dynamic noise Rz < 20 nm,
  static noise < 3 nm
  
• Max. resolution vertical: 1 nm, horizontal: 100 nm
  
• Static measuring force approx. 1 mN
  
• Evaluation software Mahr and PTB-Reference Software RPTB

• Tactile measuring system, profilometer
• Drive unit LD120, tracing length 120 mm
• Noise Rz = 35 nm
• Max. resolution vertical: 2 nm, horizontal: 50 nm
• Variabele measuring force: 0,5 mN to 30 mN
• Measuring speed from 0,1 mm/s to 2 mm/s
• Used for calibration of Depth-Setting standards up to 5 mm depth

Mahr + PTB Rauheitsmessanlage (RMA)

• Tactile measuring system, profilometer
  
• Basic device: Perthen C5D
  
• Drive unit PMK, tracing length 20 mm
  
• Pick-up, FTK3-50
  
• Dynamic noise Rz < 5 nm,
  static noise Rz < 3 nm
  
• Max. resolution vertical: 1 nm, horizontal: 200 nm
  
• Static measuring force approx. 1 mN
  
• Control and data transfer with software elaborated at PTB
  
• Evaluation software PTB and PTB-Reference Software RPTB

• Tactile measuring system, profilometer
  
• Drive unit LV-50, tracing length 50 mm
  
• Pick-up TKL 100/17, TKL 300/17, TKPK 100
  
• Dynamic noise < 18 nm,
  static noise Rz < 3 nm
  
• Max. Max. resolution vertical: 1 nm
  horizontal: 9600 points
  
• Static measuring force approx. 1 mN
  
• Evaluation software Hommel and PTB-Reference Software RPTB

• Linnik interference microscope with exchangeable reference plane
  (R = 10%, 30%, 90%)
• Illumination with Tl spectral lamp
• Cooled camera with 1300 x 1000 Pixel
• Evaluation with carrier frequency procedure
• Measuring range vertical 10 µm,
  horizontal 640 µm x 500 µm
• Noise Rz = 2 nm
• Measurement uncertainty of step height
  between 2 nm and 9 nm depending on step height
• Application: Reference instrument for
  Depth-setting standards

• Interference microscope with phase shifting and white light mode
• Objectives 2,5x to 50x and DIC 10x
• Field of view 160 µm x 120 µm
  to 3.2 mm x 2.4 mm
  
• Camera with 640 x 480 Pixel
• Vertical measuring range: white light 1 mm, phase shifting 50 µm
• Noise Rz = 0.8 nm
• Measurement uncertainty 3 nm
• Application: Topography measurements on particularly smooth surfaces

• Fizeau interferometer with exchangeable reference plane
  (R = 4%, 50%, 90%)
• Flatness error of the reference mirrors
  < λ/10
• Illumination with Tl spectral lamp
• Field of view diameter 50 mm
• Application: Qualitative documentation of the surface of measurement objects

• Universal reflected light microscope
• DIC objectives 5x to 100x
• Camera with up to 3000 x 2000 Pixel
• Field of view from 68 µm x 86 µm
  to 2.8 mm x 3.5 mm
• Application: Qualitative documentation of the surface of measurement objects

• Dissemination unit of length, vertical direction
• Range of application: Profilometer, interference microscopes, confocal microscopes
• Range of representation: 60 nm to 3000 nm
• Calibration uncertainty U > 3 nm (k=2)
• Profil:
  

• Grating etched in Si with vertical flanks
• Application: Determination of the horizontal resolution capability of optical surface measurement procedures
• Chip size 10 mm x 10 mm on glass substrate
  40 mm x 40 mm
• Range of representation: Four fields with periods from 6 µm to 200 µm with constant depth on one chip
• Depths of approx. 90 nm and 16 µm
• Profil:
  
  

• Dissemination unit of length, vertical direction
• Range of application: Profilometer, interference microscopes, confocal microscopes
• Range of representation: 200 nm to 10000 nm
• Calibration uncertainty U > 3 nm (k=2)
• Profil:
  

• Calibration of vertical and horizontal profile components
• Range of application: Profilometer
• Range of representation:
  vertical 200 nm <Rz< 10000 nm,
  horizontal 100 µm < RSm < 200 µm
• Calibration uncertainty:
  vertical U ≥ 1*10^-2 x calibration quantity (k=2)
  horizontal U ≥ 200 nm (k=2)
• Profil:
  

• Calibration of horizontal axis
• Range of application: Profilometer
• Range of representation: 10 µm < RSm < 2500 µm
• Calibration uncertainty: U ≥ 200 nm (k=2)
• Profil:
  
  

• Characterization of the whole transfer range
• Application: Profilometer, confocal microscopes, interference microscopes
• Range of representation: 150 nm < Ra < 4000 nm,
  1000 nm < Rz < 20000 nm
• Calibration uncertainty:
  U ≥ 1*10^-2 calibration quantity (k=2)
• Profil:
  
  

• Characterization of the whole instrument transfer chain
• Application: Profilometer, confocal microscopes, interference microscopes
• Range of representation: 20 nm < Ra < 80 nm,
  150 nm < Rz < 450 nm
• Calibration uncertainty: U ≥ 1*10^-2 calibration quantity (k=2)
• Profil:
  
  

• Grooves turned in amorphous Ni layer on plane Ni base
• Dissemination unit of length, vertical direction
• Application: Profilometer, interference microscopes, confocal microscopes
• Range of representation: 6 grooves from 0.24 µm to 75 µm
• Roughness of the surface approx. Rz = 15 nm
• Calibration uncertainty U > 2 nm (k=2)
• Profil:
  

• Gratings etched in Si with vertical flanks
  
• Application: Determination of the lateral resolution capability of optical surface measurement instruments
• Chip size 10 mm x 10 mm on glass substrate 40 mm x 40 mm
• Range of representation: Eight fields with periods from 4 µm to 800 µm with constant depth on one chip
• Depths of approx. 90 nm and 4 µm available