Tasks
Investigation and development of ultra-high resolution optical measurement methods for traceable dimensional measurements of micro- and nanostructures on surfaces with structure sizes down to the sub-100 nm range.
Research and development of optical microscopy methods with the aim of increasing the lateral resolving power beyond the limits of classical microscopy (Abbe limit).
Investigation and modelling of the interactions of nano-scale structures with electromagnetic radiation in terms of applications for ultra-high resolution measurement methods.
Development of dimensional optical measuring techniques for current and future 193nm technologies in particular in semiconductor industry.
Fields of work
Goniometric Scatterometry and Ellipsometry for dimensional measurements of periodic structures
Development of a high resolution 193 nm microscope for linewidth measurements
Research and development of novel superresolving dark field techniques
Further development of rigorous models for microscopy and scatterometry
Current projects
EMRP IND17: Metrology of small structures for the manufacturing of electronic and optical devices
Contact
| Head of Working Group | Dr. Bernd Bodermann Phone: +49(0)531-592 4222 Fax: +49(0)531-592 69 4222 E-mail:  Bernd Bodermann | |
| Address | Physikalisch-Technische Bundesanstalt Arbeitsgruppe 4.23 Bundesallee 100 38116 Braunschweig Germany |
© Physikalisch-Technische Bundesanstalt, last update: 2012-09-27, Webmaster Abteilung 4
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